P-108: Ultra-Thin Gas-Barrier Films Deposited by PECVD using a Novel Precursor, TG-4E, for OLED Devices

We have developed a novel precursor, TG‐4E, for inorganic gas barrier layer deposition by plasma enhanced chemical vapor deposition method and evaluated film thickness dependency of water vapor transmission rate (WVTR) of gas barrier layer deposited on polyethylene naphthalate (PEN) substrate. WVTR...

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Veröffentlicht in:	SID International Symposium Digest of technical papers 2016-05, Vol.47 (1), p.1532-1534
Hauptverfasser:	Chiba, Hirokazu, Tokuhisa, Kenji
Format:	Artikel
Sprache:	eng
Schlagworte:	Barrier layers Deposition Devices Film thickness flexible gas barrier PECVD Plasma enhanced chemical vapor deposition plastic substrate Precursors Substrates Technical papers thin film WVTR
Online-Zugang:	Volltext
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