The Impact of Shallow-Trench-Isolation Mechanical Stress on the Hysteresis Effect of Partially Depleted Silicon-on-Insulator n-Type Metal-Oxide-Semiconductor Field Effects
The impact of shallow trench isolation (STI) mechanical stress on the hysteresis effect in the output characteristics is measured in partially depleted (PD) silicon-on-insulator (SOI) metal-oxide-semiconductor field effect transistors (MOSFETs). We develop I sub(D) hysteresis, which is defined as th...
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Veröffentlicht in: | Chinese physics letters 2014-12, Vol.31 (12), p.126601-126601 |
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container_title | Chinese physics letters |
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creator | Luo, Jie-Xin Chen, Jing Chai, Zhan Lü, Kai He, Wei-Wei Yang, Yan Wang, Xi |
description | The impact of shallow trench isolation (STI) mechanical stress on the hysteresis effect in the output characteristics is measured in partially depleted (PD) silicon-on-insulator (SOI) metal-oxide-semiconductor field effect transistors (MOSFETs). We develop I sub(D) hysteresis, which is defined as the difference between I sub(D) versus V sub(D) forward sweep and reverse sweep. The fabricated devices show positive and negative peaks in I sub(D) hysteresis. The experimental results show that I sub(D) hysteresis declined as the STI mechanical stress increases. We also elaborate on the impact of STI mechanical stress on the I sub(D) hysteresis of PD SOI n-type MOSFETs. |
doi_str_mv | 10.1088/0256-307X/31/12/126601 |
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We develop I sub(D) hysteresis, which is defined as the difference between I sub(D) versus V sub(D) forward sweep and reverse sweep. The fabricated devices show positive and negative peaks in I sub(D) hysteresis. The experimental results show that I sub(D) hysteresis declined as the STI mechanical stress increases. We also elaborate on the impact of STI mechanical stress on the I sub(D) hysteresis of PD SOI n-type MOSFETs.</description><subject>Depletion</subject><subject>Devices</subject><subject>Field effect transistors</subject><subject>Hysteresis</subject><subject>MOSFETs</subject><subject>Semiconductor devices</subject><subject>Stresses</subject><subject>Trenches</subject><issn>0256-307X</issn><issn>1741-3540</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNo9kcFqGzEQhkVpoK7bVyg65qJYo92V5WNI7caQkIAd6E1opVmsIq-2kkzqZ-pLdhebwsDA8M13-H9CvgG_A67UgotGsoovfy4qWIAYR0oOH8gMljWwqqn5RzL7D30in3P-xTmAApiRv_sD0u1xMLbQ2NHdwYQQ39k-YW8PbJtjMMXHnj6jPZjeWxPoriTMmY7HMv4-nnPB8eAzXXcdXjSvJhU_ms70Ow4BCzq688Hb2LNxtn0-jdqYaM_25wFHeTGBvfzxDtkOjxPnTnYCNh6Du4rzF3LTmZDx63XPydtmvX94ZE8vP7YP90_MCqUKc620qBrXya7lIDojlODopGt4o2rVrmqcEuJmJRrHWwm1c7bG1iKs1HLFqzm5vXiHFH-fMBd99NliCKbHeMoalGjqGqSaUHlBbYo5J-z0kPzRpLMGrqd29BS8noLXFWgQ-tJO9Q8tOYYQ</recordid><startdate>201412</startdate><enddate>201412</enddate><creator>Luo, Jie-Xin</creator><creator>Chen, Jing</creator><creator>Chai, Zhan</creator><creator>Lü, Kai</creator><creator>He, Wei-Wei</creator><creator>Yang, Yan</creator><creator>Wang, Xi</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>201412</creationdate><title>The Impact of Shallow-Trench-Isolation Mechanical Stress on the Hysteresis Effect of Partially Depleted Silicon-on-Insulator n-Type Metal-Oxide-Semiconductor Field Effects</title><author>Luo, Jie-Xin ; Chen, Jing ; Chai, Zhan ; Lü, Kai ; He, Wei-Wei ; Yang, Yan ; Wang, Xi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c288t-db6ce85df6fb012fa2820ed6d505848b94e26600a925d0b614ddc4ebce1987903</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>Depletion</topic><topic>Devices</topic><topic>Field effect transistors</topic><topic>Hysteresis</topic><topic>MOSFETs</topic><topic>Semiconductor devices</topic><topic>Stresses</topic><topic>Trenches</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Luo, Jie-Xin</creatorcontrib><creatorcontrib>Chen, Jing</creatorcontrib><creatorcontrib>Chai, Zhan</creatorcontrib><creatorcontrib>Lü, Kai</creatorcontrib><creatorcontrib>He, Wei-Wei</creatorcontrib><creatorcontrib>Yang, Yan</creatorcontrib><creatorcontrib>Wang, Xi</creatorcontrib><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Chinese physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Luo, Jie-Xin</au><au>Chen, Jing</au><au>Chai, Zhan</au><au>Lü, Kai</au><au>He, Wei-Wei</au><au>Yang, Yan</au><au>Wang, Xi</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The Impact of Shallow-Trench-Isolation Mechanical Stress on the Hysteresis Effect of Partially Depleted Silicon-on-Insulator n-Type Metal-Oxide-Semiconductor Field Effects</atitle><jtitle>Chinese physics letters</jtitle><date>2014-12</date><risdate>2014</risdate><volume>31</volume><issue>12</issue><spage>126601</spage><epage>126601</epage><pages>126601-126601</pages><issn>0256-307X</issn><eissn>1741-3540</eissn><abstract>The impact of shallow trench isolation (STI) mechanical stress on the hysteresis effect in the output characteristics is measured in partially depleted (PD) silicon-on-insulator (SOI) metal-oxide-semiconductor field effect transistors (MOSFETs). We develop I sub(D) hysteresis, which is defined as the difference between I sub(D) versus V sub(D) forward sweep and reverse sweep. The fabricated devices show positive and negative peaks in I sub(D) hysteresis. The experimental results show that I sub(D) hysteresis declined as the STI mechanical stress increases. We also elaborate on the impact of STI mechanical stress on the I sub(D) hysteresis of PD SOI n-type MOSFETs.</abstract><doi>10.1088/0256-307X/31/12/126601</doi><tpages>1</tpages></addata></record> |
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subjects | Depletion Devices Field effect transistors Hysteresis MOSFETs Semiconductor devices Stresses Trenches |
title | The Impact of Shallow-Trench-Isolation Mechanical Stress on the Hysteresis Effect of Partially Depleted Silicon-on-Insulator n-Type Metal-Oxide-Semiconductor Field Effects |
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