In-assisted growth of InN nanocolumn on Si(111) substrate by molecular beam epitaxy

We have demonstrated that the thickness of the catalyst layer plays a significant role in the morphology and the material quality of the InN nanocolumns grown on Si(111) substrate by plasma-assisted molecular beam expitaxy using vapor-liquid-solid method. A systematic investigation of In catalyst fi...

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Veröffentlicht in:	Vacuum 2016-06, Vol.128, p.133-136
Hauptverfasser:	Yang, Hang, Yin, Jingzhi, Li, Wancheng, Gao, Fubin, Zhao, Yang, Wu, Guoguang, Zhang, Baolin, Du, Guotong
Format:	Artikel
Sprache:	eng
Schlagworte:	Catalyst thickness Catalysts High density InN nanocolumns Molecular beam epitaxy Molecular beams Nanostructure Optical properties Radio Substrates Vapor-liquid-solid method
Online-Zugang:	Volltext
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