A novel double gate metal source/drain Schottky MOSFET as an inverter
In this work, we propose and simulate a novel structure of a double gate metal source/drain (MSD) Schottky MOSFET. The novelty of the proposed device is that it realizes a complete CMOS inverter action, which is actually being realized by the combination of two n and p type MOS transistors in the co...
Gespeichert in:
Veröffentlicht in: | Superlattices and microstructures 2016-03, Vol.91, p.78-89 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 89 |
---|---|
container_issue | |
container_start_page | 78 |
container_title | Superlattices and microstructures |
container_volume | 91 |
creator | Loan, Sajad A. Kumar, Sunil Alamoud, Abdulrahman M. |
description | In this work, we propose and simulate a novel structure of a double gate metal source/drain (MSD) Schottky MOSFET. The novelty of the proposed device is that it realizes a complete CMOS inverter action, which is actually being realized by the combination of two n and p type MOS transistors in the conventional CMOS technology. Therefore, the use of this device will significantly reduce the transistor count in implementing combinational and sequential circuits. Further, there is a significant reduction in the number of junctions and regions in the proposed device in comparison to the conventional CMOS inverter. Therefore, the proposed device is compact and can consume less power. The proposed device has been named as Sajad-Sunil-Schottky (SSS) device. The mixed mode circuit analysis of the proposed SSS device has shown that a CMOS inverter action with high logic level (VOH) and low logic level (VOL) as ∼VDD and ∼ground respectively. A two dimensional calibrated simulation study using the experimental data has revealed that the proposed SSS device in n and p type modes have subthreshold slopes (S) of 130 mV/decade and 85 mV/decade respectively and have reasonable high ION and ION/IOFF ratio's. Furthermore, it has been proved that such a device action cannot be realised by folding the conventional doped n and p MOS transistors.
[Display omitted] |
doi_str_mv | 10.1016/j.spmi.2015.12.042 |
format | Article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1815991354</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S074960361530344X</els_id><sourcerecordid>1815991354</sourcerecordid><originalsourceid>FETCH-LOGICAL-c333t-d42bc2be8b1c9a1f7a8fcb8c647c7b235be84f03cac364c06be140e99f61f2be3</originalsourceid><addsrcrecordid>eNp9kD1PwzAQQC0EEqXwB5g8siT1V5xYYqmq8iEVdSjMluNcwCWNi-1U6r8nVZmZbrj3TrqH0D0lOSVUzrZ53O9czggtcspyItgFmlCiZMZlWV6iCSmFyiTh8hrdxLglhChBywlaznHvD9Dhxg91B_jTJMA7SKbD0Q_BwqwJxvV4Y798St9H_LbePC3fsYnY9Nj1BwgJwi26ak0X4e5vTtHHCC1estX6-XUxX2WWc56yRrDashqqmlplaFuaqrV1ZaUobVkzXowr0RJujeVSWCJroIKAUq2k7ejxKXo4390H_zNATHrnooWuMz34IWpa0UIpygsxouyM2uBjDNDqfXA7E46aEn1qprf61EyfmmnK9NhslB7PEoxPHBwEHa2D3kLjAtikG-_-038BLtJ1SQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1815991354</pqid></control><display><type>article</type><title>A novel double gate metal source/drain Schottky MOSFET as an inverter</title><source>Elsevier ScienceDirect Journals Complete</source><creator>Loan, Sajad A. ; Kumar, Sunil ; Alamoud, Abdulrahman M.</creator><creatorcontrib>Loan, Sajad A. ; Kumar, Sunil ; Alamoud, Abdulrahman M.</creatorcontrib><description>In this work, we propose and simulate a novel structure of a double gate metal source/drain (MSD) Schottky MOSFET. The novelty of the proposed device is that it realizes a complete CMOS inverter action, which is actually being realized by the combination of two n and p type MOS transistors in the conventional CMOS technology. Therefore, the use of this device will significantly reduce the transistor count in implementing combinational and sequential circuits. Further, there is a significant reduction in the number of junctions and regions in the proposed device in comparison to the conventional CMOS inverter. Therefore, the proposed device is compact and can consume less power. The proposed device has been named as Sajad-Sunil-Schottky (SSS) device. The mixed mode circuit analysis of the proposed SSS device has shown that a CMOS inverter action with high logic level (VOH) and low logic level (VOL) as ∼VDD and ∼ground respectively. A two dimensional calibrated simulation study using the experimental data has revealed that the proposed SSS device in n and p type modes have subthreshold slopes (S) of 130 mV/decade and 85 mV/decade respectively and have reasonable high ION and ION/IOFF ratio's. Furthermore, it has been proved that such a device action cannot be realised by folding the conventional doped n and p MOS transistors.
[Display omitted]</description><identifier>ISSN: 0749-6036</identifier><identifier>EISSN: 1096-3677</identifier><identifier>DOI: 10.1016/j.spmi.2015.12.042</identifier><language>eng</language><publisher>Elsevier Ltd</publisher><subject>CMOS ; Devices ; Gates (circuits) ; Inverters ; Logic ; MOSFETs ; Semiconductor devices ; Transistors</subject><ispartof>Superlattices and microstructures, 2016-03, Vol.91, p.78-89</ispartof><rights>2015 Elsevier Ltd</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c333t-d42bc2be8b1c9a1f7a8fcb8c647c7b235be84f03cac364c06be140e99f61f2be3</citedby><cites>FETCH-LOGICAL-c333t-d42bc2be8b1c9a1f7a8fcb8c647c7b235be84f03cac364c06be140e99f61f2be3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.spmi.2015.12.042$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3536,27903,27904,45974</link.rule.ids></links><search><creatorcontrib>Loan, Sajad A.</creatorcontrib><creatorcontrib>Kumar, Sunil</creatorcontrib><creatorcontrib>Alamoud, Abdulrahman M.</creatorcontrib><title>A novel double gate metal source/drain Schottky MOSFET as an inverter</title><title>Superlattices and microstructures</title><description>In this work, we propose and simulate a novel structure of a double gate metal source/drain (MSD) Schottky MOSFET. The novelty of the proposed device is that it realizes a complete CMOS inverter action, which is actually being realized by the combination of two n and p type MOS transistors in the conventional CMOS technology. Therefore, the use of this device will significantly reduce the transistor count in implementing combinational and sequential circuits. Further, there is a significant reduction in the number of junctions and regions in the proposed device in comparison to the conventional CMOS inverter. Therefore, the proposed device is compact and can consume less power. The proposed device has been named as Sajad-Sunil-Schottky (SSS) device. The mixed mode circuit analysis of the proposed SSS device has shown that a CMOS inverter action with high logic level (VOH) and low logic level (VOL) as ∼VDD and ∼ground respectively. A two dimensional calibrated simulation study using the experimental data has revealed that the proposed SSS device in n and p type modes have subthreshold slopes (S) of 130 mV/decade and 85 mV/decade respectively and have reasonable high ION and ION/IOFF ratio's. Furthermore, it has been proved that such a device action cannot be realised by folding the conventional doped n and p MOS transistors.
[Display omitted]</description><subject>CMOS</subject><subject>Devices</subject><subject>Gates (circuits)</subject><subject>Inverters</subject><subject>Logic</subject><subject>MOSFETs</subject><subject>Semiconductor devices</subject><subject>Transistors</subject><issn>0749-6036</issn><issn>1096-3677</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><recordid>eNp9kD1PwzAQQC0EEqXwB5g8siT1V5xYYqmq8iEVdSjMluNcwCWNi-1U6r8nVZmZbrj3TrqH0D0lOSVUzrZ53O9czggtcspyItgFmlCiZMZlWV6iCSmFyiTh8hrdxLglhChBywlaznHvD9Dhxg91B_jTJMA7SKbD0Q_BwqwJxvV4Y798St9H_LbePC3fsYnY9Nj1BwgJwi26ak0X4e5vTtHHCC1estX6-XUxX2WWc56yRrDashqqmlplaFuaqrV1ZaUobVkzXowr0RJujeVSWCJroIKAUq2k7ejxKXo4390H_zNATHrnooWuMz34IWpa0UIpygsxouyM2uBjDNDqfXA7E46aEn1qprf61EyfmmnK9NhslB7PEoxPHBwEHa2D3kLjAtikG-_-038BLtJ1SQ</recordid><startdate>201603</startdate><enddate>201603</enddate><creator>Loan, Sajad A.</creator><creator>Kumar, Sunil</creator><creator>Alamoud, Abdulrahman M.</creator><general>Elsevier Ltd</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>201603</creationdate><title>A novel double gate metal source/drain Schottky MOSFET as an inverter</title><author>Loan, Sajad A. ; Kumar, Sunil ; Alamoud, Abdulrahman M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c333t-d42bc2be8b1c9a1f7a8fcb8c647c7b235be84f03cac364c06be140e99f61f2be3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><topic>CMOS</topic><topic>Devices</topic><topic>Gates (circuits)</topic><topic>Inverters</topic><topic>Logic</topic><topic>MOSFETs</topic><topic>Semiconductor devices</topic><topic>Transistors</topic><toplevel>online_resources</toplevel><creatorcontrib>Loan, Sajad A.</creatorcontrib><creatorcontrib>Kumar, Sunil</creatorcontrib><creatorcontrib>Alamoud, Abdulrahman M.</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Superlattices and microstructures</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Loan, Sajad A.</au><au>Kumar, Sunil</au><au>Alamoud, Abdulrahman M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A novel double gate metal source/drain Schottky MOSFET as an inverter</atitle><jtitle>Superlattices and microstructures</jtitle><date>2016-03</date><risdate>2016</risdate><volume>91</volume><spage>78</spage><epage>89</epage><pages>78-89</pages><issn>0749-6036</issn><eissn>1096-3677</eissn><abstract>In this work, we propose and simulate a novel structure of a double gate metal source/drain (MSD) Schottky MOSFET. The novelty of the proposed device is that it realizes a complete CMOS inverter action, which is actually being realized by the combination of two n and p type MOS transistors in the conventional CMOS technology. Therefore, the use of this device will significantly reduce the transistor count in implementing combinational and sequential circuits. Further, there is a significant reduction in the number of junctions and regions in the proposed device in comparison to the conventional CMOS inverter. Therefore, the proposed device is compact and can consume less power. The proposed device has been named as Sajad-Sunil-Schottky (SSS) device. The mixed mode circuit analysis of the proposed SSS device has shown that a CMOS inverter action with high logic level (VOH) and low logic level (VOL) as ∼VDD and ∼ground respectively. A two dimensional calibrated simulation study using the experimental data has revealed that the proposed SSS device in n and p type modes have subthreshold slopes (S) of 130 mV/decade and 85 mV/decade respectively and have reasonable high ION and ION/IOFF ratio's. Furthermore, it has been proved that such a device action cannot be realised by folding the conventional doped n and p MOS transistors.
[Display omitted]</abstract><pub>Elsevier Ltd</pub><doi>10.1016/j.spmi.2015.12.042</doi><tpages>12</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0749-6036 |
ispartof | Superlattices and microstructures, 2016-03, Vol.91, p.78-89 |
issn | 0749-6036 1096-3677 |
language | eng |
recordid | cdi_proquest_miscellaneous_1815991354 |
source | Elsevier ScienceDirect Journals Complete |
subjects | CMOS Devices Gates (circuits) Inverters Logic MOSFETs Semiconductor devices Transistors |
title | A novel double gate metal source/drain Schottky MOSFET as an inverter |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-22T14%3A58%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%20novel%20double%20gate%20metal%20source/drain%20Schottky%20MOSFET%20as%20an%20inverter&rft.jtitle=Superlattices%20and%20microstructures&rft.au=Loan,%20Sajad%20A.&rft.date=2016-03&rft.volume=91&rft.spage=78&rft.epage=89&rft.pages=78-89&rft.issn=0749-6036&rft.eissn=1096-3677&rft_id=info:doi/10.1016/j.spmi.2015.12.042&rft_dat=%3Cproquest_cross%3E1815991354%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1815991354&rft_id=info:pmid/&rft_els_id=S074960361530344X&rfr_iscdi=true |