Simulation and experimental study of maskless convex corner compensation in TMAH water solution

Maskless etching with convex corner compensation in the form of a 〈1 0 0〉 oriented beam is investigated using both experiments and simulations. The maskless convex corner compensation technique is defined as a combination of masked and maskless anisotropic etching of {1 0 0} silicon in 25 wt% TMAH w...

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Veröffentlicht in:	Journal of micromechanics and microengineering 2014-11, Vol.24 (11), p.115003
Hauptverfasser:	Smiljani, Mil e M, Radjenovi, Branislav, Radmilovi -Radjenovi, Marija, Lazi, arko, Jovi, Vesna
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Compensation Corners Cross-disciplinary physics: materials science rheology Crystallography Etching Exact sciences and technology level set method maskless wet etching Materials science Mechanical engineering. Machine design Micromechanics Physics Planes Precision engineering, watch making Silicon silicon crystallographic planes Simulation Surface treatments TMAH
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