Diffraction of γ-rays with energies of 1.17 and 1.33 MeV by a flat Si crystal

Diffraction of γ-rays by a flat Si crystal has been demonstrated using a high flux 60Co source with an intensity of 2.3 TBq. The diffraction intensities of the γ-rays with energies of 1.17 and 1.33 MeV have been measured as a function of the rotation angle of the crystal. Three peaks corresponding t...

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Veröffentlicht in:Japanese Journal of Applied Physics 2015-05, Vol.54 (5), p.52203
Hauptverfasser: Matsuba, Shunya, Hayakawa, Takehito, Shizuma, Toshiyuki, Nishimori, Nobuyuki, Nagai, Ryoji, Sawamura, Masaru, Angell, Christopher T., Fujiwara, Mamoru, Hajima, Ryoichi
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container_issue 5
container_start_page 52203
container_title Japanese Journal of Applied Physics
container_volume 54
creator Matsuba, Shunya
Hayakawa, Takehito
Shizuma, Toshiyuki
Nishimori, Nobuyuki
Nagai, Ryoji
Sawamura, Masaru
Angell, Christopher T.
Fujiwara, Mamoru
Hajima, Ryoichi
description Diffraction of γ-rays by a flat Si crystal has been demonstrated using a high flux 60Co source with an intensity of 2.3 TBq. The diffraction intensities of the γ-rays with energies of 1.17 and 1.33 MeV have been measured as a function of the rotation angle of the crystal. Three peaks corresponding to the Si(440) and Si(220) diffractions for 1.17 MeV and the Si(440) diffraction for 1.33 MeV have been measured. The heights and shapes of these three peaks are well reproduced by taking into account Bragg s law and the experimental geometry.
doi_str_mv 10.7567/JJAP.54.052203
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subjects Angles (geometry)
Crystals
Diffraction
Energy measurement
Flats
Flux
Silicon
title Diffraction of γ-rays with energies of 1.17 and 1.33 MeV by a flat Si crystal
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