Adjustment of plasma properties in magnetron sputtering by pulsed powering in unipolar/bipolar hybrid pulse mode

A new method of pulsed powering the magnetron discharge using a pulsed switching of the anode has been developed. Practically, this hybrid pulse mode is a combination of the conventional unipolar and bipolar pulsed powering, where the time slices of both pulse modes can be freely adjusted at a time...

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Veröffentlicht in:	Surface & coatings technology 2016-03, Vol.290, p.73-76
Hauptverfasser:	Barth, Stephan, Bartzsch, Hagen, Glöß, Daniel, Frach, Peter, Gittner, Matthias, Labitzke, Rainer
Format:	Artikel
Sprache:	eng
Schlagworte:	Adjustment AlN Compressive properties Degrees of freedom Deposition Magnetron sputtering Piezoelectricity Plasma properties Process parameters Pulse magnetron sputtering Sputter deposition Stress control Stresses
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