Characterization of hydrogenated and deuterated silicon carbide films codeposited by magnetron sputtering

In this work we present the deposition of amorphous SiC thin films by radiofrequency dual magnetron sputtering. The dependence of the deposited films properties over the discharges electrical power and the effect of hydrogenous species (H2 and/or D2) addition to main discharge gas (Ar) were investig...

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Veröffentlicht in:	Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Beam interactions with materials and atoms, 2016-03, Vol.371, p.322-326
Hauptverfasser:	Pantelica, D., Ionescu, P., Petrascu, H., Dracea, M.D., Statescu, M., Matei, E., Rasoga, O., Stancu, C., Marascu, V., Ion, V., Acsente, T., Dinescu, G.
Format:	Artikel
Sprache:	eng
Schlagworte:	Analytical techniques Deposition Deuteration Dual magnetron sputtering ERDA Magnetron sputtering Radiofrequency RBS Silicon carbide Thickness Thin films
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