Indium antimonide based HEMT for RF applications
We report on an indium antimonide high electron mobility transistor with record cut-off frequency characteristics. For high frequency response it is important to minimize parasitic resistance and capacitance to improve short-channel effects. For analog applications adequate pinch-off behavior is dem...
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Veröffentlicht in: | Journal of semiconductors 2014-11, Vol.35 (11), p.20-22 |
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creator | Subash, T. D. Gnanasekaran, T. |
description | We report on an indium antimonide high electron mobility transistor with record cut-off frequency characteristics. For high frequency response it is important to minimize parasitic resistance and capacitance to improve short-channel effects. For analog applications adequate pinch-off behavior is demonstrated. For proper device scaling we need high electron mobility and high electron density. Toward this end, the device design features and simulation are carried out by the Synopsys TCAD tool. A 30 nm InSb HEMT exhibits an excellent cut-off frequency of 586 GHz. To the knowledge of the authors, the obtained cut-off frequency is the highest ever reported in any FET on any material system. |
doi_str_mv | 10.1088/1674-4926/35/11/113004 |
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D. ; Gnanasekaran, T.</creator><creatorcontrib>Subash, T. D. ; Gnanasekaran, T.</creatorcontrib><description>We report on an indium antimonide high electron mobility transistor with record cut-off frequency characteristics. For high frequency response it is important to minimize parasitic resistance and capacitance to improve short-channel effects. For analog applications adequate pinch-off behavior is demonstrated. For proper device scaling we need high electron mobility and high electron density. Toward this end, the device design features and simulation are carried out by the Synopsys TCAD tool. A 30 nm InSb HEMT exhibits an excellent cut-off frequency of 586 GHz. 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D.</creatorcontrib><creatorcontrib>Gnanasekaran, T.</creatorcontrib><title>Indium antimonide based HEMT for RF applications</title><title>Journal of semiconductors</title><addtitle>Chinese Journal of Semiconductors</addtitle><description>We report on an indium antimonide high electron mobility transistor with record cut-off frequency characteristics. For high frequency response it is important to minimize parasitic resistance and capacitance to improve short-channel effects. For analog applications adequate pinch-off behavior is demonstrated. For proper device scaling we need high electron mobility and high electron density. Toward this end, the device design features and simulation are carried out by the Synopsys TCAD tool. A 30 nm InSb HEMT exhibits an excellent cut-off frequency of 586 GHz. To the knowledge of the authors, the obtained cut-off frequency is the highest ever reported in any FET on any material system.</description><subject>CAD工具</subject><subject>Cut-off</subject><subject>Devices</subject><subject>Electron density</subject><subject>Electron mobility</subject><subject>HEMT</subject><subject>High electron mobility transistors</subject><subject>Indium antimonides</subject><subject>RF应用</subject><subject>Semiconductor devices</subject><subject>Semiconductors</subject><subject>Synopsys公司</subject><subject>截止频率</subject><subject>短沟道效应</subject><subject>锑化铟</subject><subject>高电子迁移率晶体管</subject><issn>1674-4926</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNo9kFFLwzAUhfOg4Jz-BSk--VKb2-Sm6aOMzQ0mgsznkKXpjLRJ13QP_ntbNgYXLpdzzoXvEPIE9BWolBmIgqe8zEXGMAMYh1HKb8jsKtyR-xh_KR1vDjNCN75ypzbRfnBt8K6yyV5HWyXr5ccuqUOffK0S3XWNM3pwwccHclvrJtrHy56T79Vyt1in28_3zeJtmxoGOKSSYlljISxUe15xLi0g5brY58bkupIlomaICCy3SNFyA4IJazSvUeR1webk5fy368PxZOOgWheNbRrtbThFBXIEkwzFZBVnq-lDjL2tVde7Vvd_CqiaalETvZroFUMFoM61jMHnS_An-MPR-cM1KUReUk6ZYP_9-WCk</recordid><startdate>20141101</startdate><enddate>20141101</enddate><creator>Subash, T. 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D.</au><au>Gnanasekaran, T.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Indium antimonide based HEMT for RF applications</atitle><jtitle>Journal of semiconductors</jtitle><addtitle>Chinese Journal of Semiconductors</addtitle><date>2014-11-01</date><risdate>2014</risdate><volume>35</volume><issue>11</issue><spage>20</spage><epage>22</epage><pages>20-22</pages><issn>1674-4926</issn><abstract>We report on an indium antimonide high electron mobility transistor with record cut-off frequency characteristics. For high frequency response it is important to minimize parasitic resistance and capacitance to improve short-channel effects. For analog applications adequate pinch-off behavior is demonstrated. For proper device scaling we need high electron mobility and high electron density. Toward this end, the device design features and simulation are carried out by the Synopsys TCAD tool. A 30 nm InSb HEMT exhibits an excellent cut-off frequency of 586 GHz. 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subjects | CAD工具 Cut-off Devices Electron density Electron mobility HEMT High electron mobility transistors Indium antimonides RF应用 Semiconductor devices Semiconductors Synopsys公司 截止频率 短沟道效应 锑化铟 高电子迁移率晶体管 |
title | Indium antimonide based HEMT for RF applications |
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