Deposition of conductive TiN shells on SiO sub(2) nanoparticles with a fluidized bed ALD reactor

Conductive TiN shells have been deposited on SiO sub(2) nanoparticles (10-20 nm primary particle size) with fluidized bed atomic layer deposition using TDMAT and NH sub(3) as precursors. Analysis of the powders confirms that shell growth saturates at approximately 0.4 nm/cycle at TDMAT doses of >...

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Veröffentlicht in:	Journal of nanoparticle research : an interdisciplinary forum for nanoscale science and technology 2016-02, Vol.18 (2), p.1-11
Hauptverfasser:	Didden, Arjen, Hillebrand, Philipp, Wollgarten, Markus, Dam, Bernard, Krol, Roel
Format:	Artikel
Sprache:	eng
Schlagworte:	Deposition Electrical resistivity Fluidized beds Nanoparticles Precursors Silicon dioxide Tin X-ray photoelectron spectroscopy
Online-Zugang:	Volltext
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