Aspects of native oxides etching on n-GaSb(100) surface

•A technology for GaSb surface cleaning is proposed.•The technology combines ion sputtering, chemical etching, annealing for oxide removal.•The ARXPS studies on GaSb surfaces are presented in a detailed manner.•The surface stoichiometry is restored after recommended technology for contacting. Galliu...

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Bibliographische Detailangaben

Veröffentlicht in:	Applied surface science 2016-02, Vol.363, p.83-90
Hauptverfasser:	Cotirlan, C., Ghita, R.V., Negrila, C.C., Logofatu, C., Frumosu, F., Lungu, G.A.
Format:	Artikel
Sprache:	eng
Schlagworte:	Annealing ARXPS Atomic force microscopy Devices Etching GaSb Information dissemination Native oxides Oxides Product innovation Scanning electron microscopy Sputtering
Online-Zugang:	Volltext
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