Differential 3ω method for measuring thermal conductivity of AlN and Si3N4 thin films

The thermal conductivity λ of plasma enhanced chemical vapor deposited Si3N4 and sputtered AlN thin films deposited on silicon substrates were obtained utilizing the differential 3ω method. A thin electrically conductive strip was deposited onto the investigated thin film of interest, and used as bo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Thin solid films 2015-09, Vol.591, p.267-270
Hauptverfasser:	Bogner, Manuel, Hofer, Alexander, Benstetter, Günther, Gruber, Hermann, Fu, Richard Y.Q.
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum nitride Deposition Electrically conductive Film thickness Heat transfer Silicon nitride Thermal conductivity Thin films Three omega method
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!