Photobase Generators Liberating Two Bases by Absorbing One Photon and Their Application to Photosensitive Materials
We propose a photobase generator (PBG) that liberates two bases by absorbing one photon. Phototriggered decarboxylation proceeds first to generate one base, and subsequently the unstable reaction intermediate is thermally decarboxylated to generate another base. It was found that the photosensitivit...
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Veröffentlicht in: | Chemistry letters 2015-09, Vol.44 (9), p.1194-1196 |
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container_title | Chemistry letters |
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creator | Arimitsu, Koji Maruyama, Yuya Furutani, Masahiro |
description | We propose a photobase generator (PBG) that liberates two bases by absorbing one photon. Phototriggered decarboxylation proceeds first to generate one base, and subsequently the unstable reaction intermediate is thermally decarboxylated to generate another base. It was found that the photosensitivity of poly(glycidyl methacrylate) films containing the PBG is much higher than that of films containing a conventional PBG that generates one base by absorbing one photon. |
doi_str_mv | 10.1246/cl.150405 |
format | Article |
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Phototriggered decarboxylation proceeds first to generate one base, and subsequently the unstable reaction intermediate is thermally decarboxylated to generate another base. It was found that the photosensitivity of poly(glycidyl methacrylate) films containing the PBG is much higher than that of films containing a conventional PBG that generates one base by absorbing one photon.</description><identifier>ISSN: 0366-7022</identifier><identifier>EISSN: 1348-0715</identifier><identifier>DOI: 10.1246/cl.150405</identifier><language>eng</language><publisher>Tokyo: The Chemical Society of Japan</publisher><subject>Absorption ; Decarboxylation ; Generators ; Photons ; Photosensitivity</subject><ispartof>Chemistry letters, 2015-09, Vol.44 (9), p.1194-1196</ispartof><rights>The Chemical Society of Japan</rights><rights>Copyright Japan Science and Technology Agency 2015</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c403t-27798470ca8e0c68cb801250daf7f32d45bf2396fef69c0e54c7667c68fb36e93</citedby><cites>FETCH-LOGICAL-c403t-27798470ca8e0c68cb801250daf7f32d45bf2396fef69c0e54c7667c68fb36e93</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>Arimitsu, Koji</creatorcontrib><creatorcontrib>Maruyama, Yuya</creatorcontrib><creatorcontrib>Furutani, Masahiro</creatorcontrib><title>Photobase Generators Liberating Two Bases by Absorbing One Photon and Their Application to Photosensitive Materials</title><title>Chemistry letters</title><addtitle>Chemistry Letters</addtitle><description>We propose a photobase generator (PBG) that liberates two bases by absorbing one photon. Phototriggered decarboxylation proceeds first to generate one base, and subsequently the unstable reaction intermediate is thermally decarboxylated to generate another base. It was found that the photosensitivity of poly(glycidyl methacrylate) films containing the PBG is much higher than that of films containing a conventional PBG that generates one base by absorbing one photon.</description><subject>Absorption</subject><subject>Decarboxylation</subject><subject>Generators</subject><subject>Photons</subject><subject>Photosensitivity</subject><issn>0366-7022</issn><issn>1348-0715</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><recordid>eNplkDFPwzAQhS0EEqUw8A8sscCQco4TOxkLgoJUVIYyR457oa5SO9gpqP8el3ZAMN3p3feeTo-QSwYjlmbiVrcjlkMG-REZMJ4VCUiWH5MBcCESCWl6Ss5CWAFAUfJ0QMLr0vWuVgHpBC161Tsf6NTUu9XYdzr_cvQungOtt3RcB-frnTyzSH-sliq7oPMlGk_HXdcaHX1R7d3-HtAG05tPpC-qR29UG87JSRMHXhzmkLw9Pszvn5LpbPJ8P54mOgPeJ6mUZZFJ0KpA0KLQdQEszWGhGtnwdJHldZPyUjTYiFID5pmWQshINjUXWPIhud7ndt59bDD01doEjW2rLLpNqJgsBBNMsiKiV3_Qldt4G7-LVM5LyIXcUTd7SnsXgsem6rxZK7-tGFS7-ivdVvv6IysO7BLXsZQ2OG2w365Up-yv9H_GbxYGir0</recordid><startdate>20150905</startdate><enddate>20150905</enddate><creator>Arimitsu, Koji</creator><creator>Maruyama, Yuya</creator><creator>Furutani, Masahiro</creator><general>The Chemical Society of Japan</general><general>Chemical Society of Japan</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20150905</creationdate><title>Photobase Generators Liberating Two Bases by Absorbing One Photon and Their Application to Photosensitive Materials</title><author>Arimitsu, Koji ; Maruyama, Yuya ; Furutani, Masahiro</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c403t-27798470ca8e0c68cb801250daf7f32d45bf2396fef69c0e54c7667c68fb36e93</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>Absorption</topic><topic>Decarboxylation</topic><topic>Generators</topic><topic>Photons</topic><topic>Photosensitivity</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Arimitsu, Koji</creatorcontrib><creatorcontrib>Maruyama, Yuya</creatorcontrib><creatorcontrib>Furutani, Masahiro</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Chemistry letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Arimitsu, Koji</au><au>Maruyama, Yuya</au><au>Furutani, Masahiro</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Photobase Generators Liberating Two Bases by Absorbing One Photon and Their Application to Photosensitive Materials</atitle><jtitle>Chemistry letters</jtitle><addtitle>Chemistry Letters</addtitle><date>2015-09-05</date><risdate>2015</risdate><volume>44</volume><issue>9</issue><spage>1194</spage><epage>1196</epage><pages>1194-1196</pages><issn>0366-7022</issn><eissn>1348-0715</eissn><abstract>We propose a photobase generator (PBG) that liberates two bases by absorbing one photon. 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ispartof | Chemistry letters, 2015-09, Vol.44 (9), p.1194-1196 |
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language | eng |
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source | Oxford University Press Journals All Titles (1996-Current) |
subjects | Absorption Decarboxylation Generators Photons Photosensitivity |
title | Photobase Generators Liberating Two Bases by Absorbing One Photon and Their Application to Photosensitive Materials |
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