Direct growth of Si nanowires on flexible organic substrates

A key characteristic of semiconductor nanowires (NWs) is that they grow on any substrate that can withstand the growth conditions, paving the way for their use in flexible electronics. We report on the direct growth of crystalline silicon nanowires on polyimide substrates. The Si NWs are grown by pl...

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Veröffentlicht in:Nanotechnology 2016-06, Vol.27 (22), p.225601-225601
Hauptverfasser: Tian (田琳), Lin, Di Mario, Lorenzo, Minotti, Antonio, Tiburzi, Giorgio, Mendis, Budhika G, Zeze, Dagou A, Martelli, Faustino
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container_end_page 225601
container_issue 22
container_start_page 225601
container_title Nanotechnology
container_volume 27
creator Tian (田琳), Lin
Di Mario, Lorenzo
Minotti, Antonio
Tiburzi, Giorgio
Mendis, Budhika G
Zeze, Dagou A
Martelli, Faustino
description A key characteristic of semiconductor nanowires (NWs) is that they grow on any substrate that can withstand the growth conditions, paving the way for their use in flexible electronics. We report on the direct growth of crystalline silicon nanowires on polyimide substrates. The Si NWs are grown by plasma-enhanced chemical vapor deposition, which allows the growth to proceed at temperatures low enough to be compatible with plastic substrates (350 °C), where gold or indium are used as growth seeds. In is particularly interesting as the seed not only because it leads to a better NW crystal quality but also because it overcomes a core problem induced by the use of Au in silicon processing, i.e. Au creates deep carrier traps when incorporated in the nanowires.
doi_str_mv 10.1088/0957-4484/27/22/225601
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fullrecord <record><control><sourceid>proquest_pubme</sourceid><recordid>TN_cdi_proquest_miscellaneous_1785215219</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1825454339</sourcerecordid><originalsourceid>FETCH-LOGICAL-c469t-8f6bbadea149e2a33b61981201c6f9d7adbd302d0feeb2082e9133c6116fb7803</originalsourceid><addsrcrecordid>eNqFkV1LwzAUhoMobk7_wuilXtTlJG2agjcyP2HghXodkjaZHV0zk5bpvzelcyAIgwOBw_Oew3mC0BTwNWDOZzhPszhJeDIj2YyQUCnDcITGQBnELCX8GI330Aideb_CGIATOEUjkuGcp4SO0c1d5XTRRktnt-1HZE30WkWNbOw29H1km8jU-qtStY6sW8qmKiLfKd862Wp_jk6MrL2-2L0T9P5w_zZ_ihcvj8_z20VcJCxvY26YUrLUEpJcE0mpYpBzIBgKZvIyk6UqKSYlNlorgjnROVBaMABmVMYxnaDLYe7G2c9O-1asK1_oupaNtp0X4ao0SRNK88NoFu6GUD3KBrRw1nunjdi4ai3dtwAsesmi9yd6f4JkghAxSA7B6W5Hp9a63Md-rQaADEBlN2JlO9cEO4enXv0T6r_iDyc2paE_he2TLA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1785215219</pqid></control><display><type>article</type><title>Direct growth of Si nanowires on flexible organic substrates</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Tian (田琳), Lin ; Di Mario, Lorenzo ; Minotti, Antonio ; Tiburzi, Giorgio ; Mendis, Budhika G ; Zeze, Dagou A ; Martelli, Faustino</creator><creatorcontrib>Tian (田琳), Lin ; Di Mario, Lorenzo ; Minotti, Antonio ; Tiburzi, Giorgio ; Mendis, Budhika G ; Zeze, Dagou A ; Martelli, Faustino</creatorcontrib><description>A key characteristic of semiconductor nanowires (NWs) is that they grow on any substrate that can withstand the growth conditions, paving the way for their use in flexible electronics. We report on the direct growth of crystalline silicon nanowires on polyimide substrates. The Si NWs are grown by plasma-enhanced chemical vapor deposition, which allows the growth to proceed at temperatures low enough to be compatible with plastic substrates (350 °C), where gold or indium are used as growth seeds. In is particularly interesting as the seed not only because it leads to a better NW crystal quality but also because it overcomes a core problem induced by the use of Au in silicon processing, i.e. Au creates deep carrier traps when incorporated in the nanowires.</description><identifier>ISSN: 0957-4484</identifier><identifier>EISSN: 1361-6528</identifier><identifier>DOI: 10.1088/0957-4484/27/22/225601</identifier><identifier>PMID: 27098523</identifier><identifier>CODEN: NNOTER</identifier><language>eng</language><publisher>England: IOP Publishing</publisher><subject>Crystal structure ; Electronics ; flexible electronics ; Gold ; Indium ; Nanowires ; plasma-enhanced chemical vapor deposition ; polyimide ; Seeds ; Semiconductors ; silicon nanowires ; Silicon substrates</subject><ispartof>Nanotechnology, 2016-06, Vol.27 (22), p.225601-225601</ispartof><rights>2016 IOP Publishing Ltd</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c469t-8f6bbadea149e2a33b61981201c6f9d7adbd302d0feeb2082e9133c6116fb7803</citedby><cites>FETCH-LOGICAL-c469t-8f6bbadea149e2a33b61981201c6f9d7adbd302d0feeb2082e9133c6116fb7803</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/0957-4484/27/22/225601/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,776,780,27903,27904,53824,53871</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/27098523$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Tian (田琳), Lin</creatorcontrib><creatorcontrib>Di Mario, Lorenzo</creatorcontrib><creatorcontrib>Minotti, Antonio</creatorcontrib><creatorcontrib>Tiburzi, Giorgio</creatorcontrib><creatorcontrib>Mendis, Budhika G</creatorcontrib><creatorcontrib>Zeze, Dagou A</creatorcontrib><creatorcontrib>Martelli, Faustino</creatorcontrib><title>Direct growth of Si nanowires on flexible organic substrates</title><title>Nanotechnology</title><addtitle>NANO</addtitle><addtitle>Nanotechnology</addtitle><description>A key characteristic of semiconductor nanowires (NWs) is that they grow on any substrate that can withstand the growth conditions, paving the way for their use in flexible electronics. We report on the direct growth of crystalline silicon nanowires on polyimide substrates. The Si NWs are grown by plasma-enhanced chemical vapor deposition, which allows the growth to proceed at temperatures low enough to be compatible with plastic substrates (350 °C), where gold or indium are used as growth seeds. In is particularly interesting as the seed not only because it leads to a better NW crystal quality but also because it overcomes a core problem induced by the use of Au in silicon processing, i.e. Au creates deep carrier traps when incorporated in the nanowires.</description><subject>Crystal structure</subject><subject>Electronics</subject><subject>flexible electronics</subject><subject>Gold</subject><subject>Indium</subject><subject>Nanowires</subject><subject>plasma-enhanced chemical vapor deposition</subject><subject>polyimide</subject><subject>Seeds</subject><subject>Semiconductors</subject><subject>silicon nanowires</subject><subject>Silicon substrates</subject><issn>0957-4484</issn><issn>1361-6528</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><recordid>eNqFkV1LwzAUhoMobk7_wuilXtTlJG2agjcyP2HghXodkjaZHV0zk5bpvzelcyAIgwOBw_Oew3mC0BTwNWDOZzhPszhJeDIj2YyQUCnDcITGQBnELCX8GI330Aideb_CGIATOEUjkuGcp4SO0c1d5XTRRktnt-1HZE30WkWNbOw29H1km8jU-qtStY6sW8qmKiLfKd862Wp_jk6MrL2-2L0T9P5w_zZ_ihcvj8_z20VcJCxvY26YUrLUEpJcE0mpYpBzIBgKZvIyk6UqKSYlNlorgjnROVBaMABmVMYxnaDLYe7G2c9O-1asK1_oupaNtp0X4ao0SRNK88NoFu6GUD3KBrRw1nunjdi4ai3dtwAsesmi9yd6f4JkghAxSA7B6W5Hp9a63Md-rQaADEBlN2JlO9cEO4enXv0T6r_iDyc2paE_he2TLA</recordid><startdate>20160603</startdate><enddate>20160603</enddate><creator>Tian (田琳), Lin</creator><creator>Di Mario, Lorenzo</creator><creator>Minotti, Antonio</creator><creator>Tiburzi, Giorgio</creator><creator>Mendis, Budhika G</creator><creator>Zeze, Dagou A</creator><creator>Martelli, Faustino</creator><general>IOP Publishing</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>F28</scope><scope>FR3</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20160603</creationdate><title>Direct growth of Si nanowires on flexible organic substrates</title><author>Tian (田琳), Lin ; Di Mario, Lorenzo ; Minotti, Antonio ; Tiburzi, Giorgio ; Mendis, Budhika G ; Zeze, Dagou A ; Martelli, Faustino</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c469t-8f6bbadea149e2a33b61981201c6f9d7adbd302d0feeb2082e9133c6116fb7803</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><topic>Crystal structure</topic><topic>Electronics</topic><topic>flexible electronics</topic><topic>Gold</topic><topic>Indium</topic><topic>Nanowires</topic><topic>plasma-enhanced chemical vapor deposition</topic><topic>polyimide</topic><topic>Seeds</topic><topic>Semiconductors</topic><topic>silicon nanowires</topic><topic>Silicon substrates</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tian (田琳), Lin</creatorcontrib><creatorcontrib>Di Mario, Lorenzo</creatorcontrib><creatorcontrib>Minotti, Antonio</creatorcontrib><creatorcontrib>Tiburzi, Giorgio</creatorcontrib><creatorcontrib>Mendis, Budhika G</creatorcontrib><creatorcontrib>Zeze, Dagou A</creatorcontrib><creatorcontrib>Martelli, Faustino</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ANTE: Abstracts in New Technology &amp; Engineering</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Nanotechnology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Tian (田琳), Lin</au><au>Di Mario, Lorenzo</au><au>Minotti, Antonio</au><au>Tiburzi, Giorgio</au><au>Mendis, Budhika G</au><au>Zeze, Dagou A</au><au>Martelli, Faustino</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Direct growth of Si nanowires on flexible organic substrates</atitle><jtitle>Nanotechnology</jtitle><stitle>NANO</stitle><addtitle>Nanotechnology</addtitle><date>2016-06-03</date><risdate>2016</risdate><volume>27</volume><issue>22</issue><spage>225601</spage><epage>225601</epage><pages>225601-225601</pages><issn>0957-4484</issn><eissn>1361-6528</eissn><coden>NNOTER</coden><abstract>A key characteristic of semiconductor nanowires (NWs) is that they grow on any substrate that can withstand the growth conditions, paving the way for their use in flexible electronics. We report on the direct growth of crystalline silicon nanowires on polyimide substrates. The Si NWs are grown by plasma-enhanced chemical vapor deposition, which allows the growth to proceed at temperatures low enough to be compatible with plastic substrates (350 °C), where gold or indium are used as growth seeds. In is particularly interesting as the seed not only because it leads to a better NW crystal quality but also because it overcomes a core problem induced by the use of Au in silicon processing, i.e. Au creates deep carrier traps when incorporated in the nanowires.</abstract><cop>England</cop><pub>IOP Publishing</pub><pmid>27098523</pmid><doi>10.1088/0957-4484/27/22/225601</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record>
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subjects Crystal structure
Electronics
flexible electronics
Gold
Indium
Nanowires
plasma-enhanced chemical vapor deposition
polyimide
Seeds
Semiconductors
silicon nanowires
Silicon substrates
title Direct growth of Si nanowires on flexible organic substrates
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T02%3A08%3A29IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_pubme&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Direct%20growth%20of%20Si%20nanowires%20on%20flexible%20organic%20substrates&rft.jtitle=Nanotechnology&rft.au=Tian%20(%E7%94%B0%E7%90%B3),%20Lin&rft.date=2016-06-03&rft.volume=27&rft.issue=22&rft.spage=225601&rft.epage=225601&rft.pages=225601-225601&rft.issn=0957-4484&rft.eissn=1361-6528&rft.coden=NNOTER&rft_id=info:doi/10.1088/0957-4484/27/22/225601&rft_dat=%3Cproquest_pubme%3E1825454339%3C/proquest_pubme%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1785215219&rft_id=info:pmid/27098523&rfr_iscdi=true