Advantage of dual-confined plasmas over conventional and facing-target plasmas for improving transparent-conductive properties in Al doped ZnO thin films

Al doped ZnO films are prepared in dual-confined plasmas (rectangular side-ways and one top-side) in DC magnetron sputtering system without intentional substrate-heating. Present confinement shows improved transparent-conductive properties in Al doped ZnO thin films, when compared to those of deposi...

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Veröffentlicht in:	Surface & coatings technology 2015-12, Vol.284, p.85-89
Hauptverfasser:	Wen, Long, Kumar, Manish, Sahu, B.B., Jin, S.B., Sawangrat, C., Leksakul, K., Han, J.G.
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum Confinement DC sputtering Density Deposition Magnetron sputtering Optical emission spectroscopy Plasma diagnostics Plasmas Thin films Transparent conductive oxides Zinc oxide
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