Modulate the deposition rate through changing the combination of frequency and pulse width at constant duty cycle

Due to the large degree of ionization of the sputtered flux and high quality film fabrication, high power pulsed magnetron sputtering (HPPMS) is widely used. However, compared with DC sputtering, low deposition rate is probably the drawback of the HPPMS technique and restricts its application. In or...

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Veröffentlicht in:	Surface & coatings technology 2015-11, Vol.281, p.27-34
Hauptverfasser:	Wu, B.H., Wang, Y., Yu, Y., Jiang, F., Sun, H., Jing, F.J., Zhu, Shengfa, Wu, Yanping, Leng, Y.X., Huang, N.
Format:	Artikel
Sprache:	eng
Schlagworte:	Constants Crystallites Deposition Duty cycle Flux Frequency High power pulsed magnetron sputtering (HPPMS) Normalized static deposition rate Pulse width Surface roughness Thin films Titanium
Online-Zugang:	Volltext
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