Ultrasmooth Polydopamine Modified Surfaces for Block Copolymer Nanopatterning on Flexible Substrates

Nature has engineered universal, catechol-containing adhesives which can be synthetically mimicked in the form of polydopamine (PDA). In this study, PDA was exploited to enable the formation of block copolymer (BCP) nanopatterns on a variety of soft material surfaces. While conventional PDA coating...

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Veröffentlicht in:ACS applied materials & interfaces 2016-03, Vol.8 (11), p.7456-7463
Hauptverfasser: Cho, Joon Hee, Katsumata, Reika, Zhou, Sunshine X, Kim, Chae Bin, Dulaney, Austin R, Janes, Dustin W, Ellison, Christopher J
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container_issue 11
container_start_page 7456
container_title ACS applied materials & interfaces
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creator Cho, Joon Hee
Katsumata, Reika
Zhou, Sunshine X
Kim, Chae Bin
Dulaney, Austin R
Janes, Dustin W
Ellison, Christopher J
description Nature has engineered universal, catechol-containing adhesives which can be synthetically mimicked in the form of polydopamine (PDA). In this study, PDA was exploited to enable the formation of block copolymer (BCP) nanopatterns on a variety of soft material surfaces. While conventional PDA coating times (1 h) produce a layer too rough for most applications of BCP nanopatterning, we found that these substrates could be polished by bath sonication in a weakly basic solution to form a conformal, smooth (root-mean-square roughness ∼0.4 nm), and thin (3 nm) layer free of large prominent granules. This chemically functionalized, biomimetic layer served as a reactive platform for subsequently grafting a surface neutral layer of poly­(styrene-random-methyl methacrylate-random-glycidyl methacrylate) to perpendicularly orient lamellae-forming poly­(styrene-block-methyl methacrylate) BCP. Moreover, scanning electron microscopy observations confirmed that a BCP nanopattern on a poly­(ethylene terephthalate) substrate was not affected by bending with a radius of ∼0.5 cm. This procedure enables nondestructive, plasma-free surface modification of chemically inert, low-surface energy soft materials, thus overcoming many current chemical and physical limitations that may impede high-throughput, roll-to-roll nanomanufacturing.
doi_str_mv 10.1021/acsami.6b00626
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1775631654</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1775631654</sourcerecordid><originalsourceid>FETCH-LOGICAL-a396t-72219f0706d091c8f7011f661e17a819e2762ba62fda561d98e390394ab86cad3</originalsourceid><addsrcrecordid>eNp1kM1LwzAYh4MoTqdXj5KjCJ1J2qbNUYdTYX6A7hzS5o12tk1NWnD_vZHO3TzlPTzPA_khdEbJjBJGr1TpVVPNeEEIZ3wPHVGRJFHOUra_u5Nkgo69XwckZiQ9RBPGRcLSNDlCelX3TvnG2v4Dv9h6o20Xgi3gR6srU4HGr4MzqgSPjXX4prblJ57bLqANOPyk2iD0Pbi2at-xbfGihu-qqCF4hQ_tHvwJOjCq9nC6fadotbh9m99Hy-e7h_n1MlKx4H2UMUaFIRnhmgha5iYjlBrOKdBM5VQAyzgrFGdGq5RTLXKIBYlFooqcl0rHU3QxdjtnvwbwvWwqX0Jdqxbs4CXNspTHlKdJQGcjWjrrvQMjO1c1ym0kJfJ3WTkuK7fLBuF82x6KBvQO_5syAJcjEES5toNrw1f_q_0AwY2ELA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1775631654</pqid></control><display><type>article</type><title>Ultrasmooth Polydopamine Modified Surfaces for Block Copolymer Nanopatterning on Flexible Substrates</title><source>American Chemical Society Journals</source><creator>Cho, Joon Hee ; Katsumata, Reika ; Zhou, Sunshine X ; Kim, Chae Bin ; Dulaney, Austin R ; Janes, Dustin W ; Ellison, Christopher J</creator><creatorcontrib>Cho, Joon Hee ; Katsumata, Reika ; Zhou, Sunshine X ; Kim, Chae Bin ; Dulaney, Austin R ; Janes, Dustin W ; Ellison, Christopher J</creatorcontrib><description>Nature has engineered universal, catechol-containing adhesives which can be synthetically mimicked in the form of polydopamine (PDA). In this study, PDA was exploited to enable the formation of block copolymer (BCP) nanopatterns on a variety of soft material surfaces. While conventional PDA coating times (1 h) produce a layer too rough for most applications of BCP nanopatterning, we found that these substrates could be polished by bath sonication in a weakly basic solution to form a conformal, smooth (root-mean-square roughness ∼0.4 nm), and thin (3 nm) layer free of large prominent granules. This chemically functionalized, biomimetic layer served as a reactive platform for subsequently grafting a surface neutral layer of poly­(styrene-random-methyl methacrylate-random-glycidyl methacrylate) to perpendicularly orient lamellae-forming poly­(styrene-block-methyl methacrylate) BCP. Moreover, scanning electron microscopy observations confirmed that a BCP nanopattern on a poly­(ethylene terephthalate) substrate was not affected by bending with a radius of ∼0.5 cm. This procedure enables nondestructive, plasma-free surface modification of chemically inert, low-surface energy soft materials, thus overcoming many current chemical and physical limitations that may impede high-throughput, roll-to-roll nanomanufacturing.</description><identifier>ISSN: 1944-8244</identifier><identifier>EISSN: 1944-8252</identifier><identifier>DOI: 10.1021/acsami.6b00626</identifier><identifier>PMID: 26942554</identifier><language>eng</language><publisher>United States: American Chemical Society</publisher><ispartof>ACS applied materials &amp; interfaces, 2016-03, Vol.8 (11), p.7456-7463</ispartof><rights>Copyright © 2016 American Chemical Society</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a396t-72219f0706d091c8f7011f661e17a819e2762ba62fda561d98e390394ab86cad3</citedby><cites>FETCH-LOGICAL-a396t-72219f0706d091c8f7011f661e17a819e2762ba62fda561d98e390394ab86cad3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/acsami.6b00626$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/acsami.6b00626$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>314,780,784,2765,27076,27924,27925,56738,56788</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/26942554$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Cho, Joon Hee</creatorcontrib><creatorcontrib>Katsumata, Reika</creatorcontrib><creatorcontrib>Zhou, Sunshine X</creatorcontrib><creatorcontrib>Kim, Chae Bin</creatorcontrib><creatorcontrib>Dulaney, Austin R</creatorcontrib><creatorcontrib>Janes, Dustin W</creatorcontrib><creatorcontrib>Ellison, Christopher J</creatorcontrib><title>Ultrasmooth Polydopamine Modified Surfaces for Block Copolymer Nanopatterning on Flexible Substrates</title><title>ACS applied materials &amp; interfaces</title><addtitle>ACS Appl. Mater. Interfaces</addtitle><description>Nature has engineered universal, catechol-containing adhesives which can be synthetically mimicked in the form of polydopamine (PDA). In this study, PDA was exploited to enable the formation of block copolymer (BCP) nanopatterns on a variety of soft material surfaces. While conventional PDA coating times (1 h) produce a layer too rough for most applications of BCP nanopatterning, we found that these substrates could be polished by bath sonication in a weakly basic solution to form a conformal, smooth (root-mean-square roughness ∼0.4 nm), and thin (3 nm) layer free of large prominent granules. This chemically functionalized, biomimetic layer served as a reactive platform for subsequently grafting a surface neutral layer of poly­(styrene-random-methyl methacrylate-random-glycidyl methacrylate) to perpendicularly orient lamellae-forming poly­(styrene-block-methyl methacrylate) BCP. Moreover, scanning electron microscopy observations confirmed that a BCP nanopattern on a poly­(ethylene terephthalate) substrate was not affected by bending with a radius of ∼0.5 cm. This procedure enables nondestructive, plasma-free surface modification of chemically inert, low-surface energy soft materials, thus overcoming many current chemical and physical limitations that may impede high-throughput, roll-to-roll nanomanufacturing.</description><issn>1944-8244</issn><issn>1944-8252</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><recordid>eNp1kM1LwzAYh4MoTqdXj5KjCJ1J2qbNUYdTYX6A7hzS5o12tk1NWnD_vZHO3TzlPTzPA_khdEbJjBJGr1TpVVPNeEEIZ3wPHVGRJFHOUra_u5Nkgo69XwckZiQ9RBPGRcLSNDlCelX3TvnG2v4Dv9h6o20Xgi3gR6srU4HGr4MzqgSPjXX4prblJ57bLqANOPyk2iD0Pbi2at-xbfGihu-qqCF4hQ_tHvwJOjCq9nC6fadotbh9m99Hy-e7h_n1MlKx4H2UMUaFIRnhmgha5iYjlBrOKdBM5VQAyzgrFGdGq5RTLXKIBYlFooqcl0rHU3QxdjtnvwbwvWwqX0Jdqxbs4CXNspTHlKdJQGcjWjrrvQMjO1c1ym0kJfJ3WTkuK7fLBuF82x6KBvQO_5syAJcjEES5toNrw1f_q_0AwY2ELA</recordid><startdate>20160323</startdate><enddate>20160323</enddate><creator>Cho, Joon Hee</creator><creator>Katsumata, Reika</creator><creator>Zhou, Sunshine X</creator><creator>Kim, Chae Bin</creator><creator>Dulaney, Austin R</creator><creator>Janes, Dustin W</creator><creator>Ellison, Christopher J</creator><general>American Chemical Society</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope></search><sort><creationdate>20160323</creationdate><title>Ultrasmooth Polydopamine Modified Surfaces for Block Copolymer Nanopatterning on Flexible Substrates</title><author>Cho, Joon Hee ; Katsumata, Reika ; Zhou, Sunshine X ; Kim, Chae Bin ; Dulaney, Austin R ; Janes, Dustin W ; Ellison, Christopher J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a396t-72219f0706d091c8f7011f661e17a819e2762ba62fda561d98e390394ab86cad3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Cho, Joon Hee</creatorcontrib><creatorcontrib>Katsumata, Reika</creatorcontrib><creatorcontrib>Zhou, Sunshine X</creatorcontrib><creatorcontrib>Kim, Chae Bin</creatorcontrib><creatorcontrib>Dulaney, Austin R</creatorcontrib><creatorcontrib>Janes, Dustin W</creatorcontrib><creatorcontrib>Ellison, Christopher J</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>ACS applied materials &amp; interfaces</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Cho, Joon Hee</au><au>Katsumata, Reika</au><au>Zhou, Sunshine X</au><au>Kim, Chae Bin</au><au>Dulaney, Austin R</au><au>Janes, Dustin W</au><au>Ellison, Christopher J</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Ultrasmooth Polydopamine Modified Surfaces for Block Copolymer Nanopatterning on Flexible Substrates</atitle><jtitle>ACS applied materials &amp; interfaces</jtitle><addtitle>ACS Appl. Mater. Interfaces</addtitle><date>2016-03-23</date><risdate>2016</risdate><volume>8</volume><issue>11</issue><spage>7456</spage><epage>7463</epage><pages>7456-7463</pages><issn>1944-8244</issn><eissn>1944-8252</eissn><abstract>Nature has engineered universal, catechol-containing adhesives which can be synthetically mimicked in the form of polydopamine (PDA). In this study, PDA was exploited to enable the formation of block copolymer (BCP) nanopatterns on a variety of soft material surfaces. While conventional PDA coating times (1 h) produce a layer too rough for most applications of BCP nanopatterning, we found that these substrates could be polished by bath sonication in a weakly basic solution to form a conformal, smooth (root-mean-square roughness ∼0.4 nm), and thin (3 nm) layer free of large prominent granules. This chemically functionalized, biomimetic layer served as a reactive platform for subsequently grafting a surface neutral layer of poly­(styrene-random-methyl methacrylate-random-glycidyl methacrylate) to perpendicularly orient lamellae-forming poly­(styrene-block-methyl methacrylate) BCP. Moreover, scanning electron microscopy observations confirmed that a BCP nanopattern on a poly­(ethylene terephthalate) substrate was not affected by bending with a radius of ∼0.5 cm. This procedure enables nondestructive, plasma-free surface modification of chemically inert, low-surface energy soft materials, thus overcoming many current chemical and physical limitations that may impede high-throughput, roll-to-roll nanomanufacturing.</abstract><cop>United States</cop><pub>American Chemical Society</pub><pmid>26942554</pmid><doi>10.1021/acsami.6b00626</doi><tpages>8</tpages></addata></record>
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1944-8252
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title Ultrasmooth Polydopamine Modified Surfaces for Block Copolymer Nanopatterning on Flexible Substrates
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T03%3A33%3A47IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Ultrasmooth%20Polydopamine%20Modified%20Surfaces%20for%20Block%20Copolymer%20Nanopatterning%20on%20Flexible%20Substrates&rft.jtitle=ACS%20applied%20materials%20&%20interfaces&rft.au=Cho,%20Joon%20Hee&rft.date=2016-03-23&rft.volume=8&rft.issue=11&rft.spage=7456&rft.epage=7463&rft.pages=7456-7463&rft.issn=1944-8244&rft.eissn=1944-8252&rft_id=info:doi/10.1021/acsami.6b00626&rft_dat=%3Cproquest_cross%3E1775631654%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1775631654&rft_id=info:pmid/26942554&rfr_iscdi=true