Structure and hardness of quaternary TiZrSiN thin films deposited by reactive magnetron co-sputtering

The addition of Si into (Ti,Zr)N films is considered to be perspective for their hardness enhancement as well as improvement of oxidation and wear resistance. In the present work, the influence of the silicon content and deposition temperature (270 and 600°C) on the structural and mechanical propert...

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Veröffentlicht in:	Thin solid films 2015-04, Vol.581, p.25-31
Hauptverfasser:	Saladukhin, I.A., Abadias, G., Michel, A., Uglov, V.V., Zlotski, S.V., Dub, S.N., Tolmachova, G.N.
Format:	Artikel
Sprache:	eng
Schlagworte:	Deposition Formations Hardness Magnetron sputtering Nanocomposite Nanocomposites Phase formation Silicon Solid solutions Stress Thin films Titanium zirconium silicon nitride X-rays
Online-Zugang:	Volltext
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