Capturing Wetting States in Nanopatterned Silicon

Spectacular progress in developing advanced Si circuits with reduced size, along the track of Moore’s law, has been relying on necessary developments in wet cleaning of nanopatterned Si wafers to provide contaminant free surfaces. The most efficient cleaning is achieved when complete wetting can be...

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Veröffentlicht in:	ACS nano 2014-01, Vol.8 (1), p.885-893
Hauptverfasser:	Xu, XiuMei, Vereecke, Guy, Chen, Chang, Pourtois, Geoffrey, Armini, Silvia, Verellen, Niels, Tsai, Wei-Kang, Kim, Dong-Wook, Lee, Eunsongyi, Lin, Chang-You, Van Dorpe, Pol, Struyf, Herbert, Holsteyns, Frank, Moshchalkov, Victor, Indekeu, Joseph, De Gendt, Stefan
Format:	Artikel
Sprache:	eng
Schlagworte:	Arrays Cleaning Contact angle Deviation Imbibition Molecular dynamics Nanostructure Silicon Wetting
Online-Zugang:	Volltext
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