The Study of Nickel on Copper Nitride Thin Films Deposited by Magnetron Sputtering

Ni-doped copper nitride films have been prepared by co-sputtering of Ni and Cu targets. The addition of Ni to Cu3N films reduced the intensity of the (111) diffraction peak, and lead a little angular shifts of the peaks. The films showed a large difference in reflectance in the infrared and visible...

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Veröffentlicht in:	Key engineering materials 2014-12, Vol.636, p.29-32
Hauptverfasser:	Yang, Jian Bo, Han, Jia, Li, Xing Ao, Yang, Tao, Yang, Rong, Yang, Jian Ping, Gu, Min Fen, Liu, Wen Jie
Format:	Artikel
Sprache:	eng
Schlagworte:	Copper COPPER NITRIDE DEPOSITION Diffraction Infrared Nickel Nitrides Reflectivity SEMICONDUCTORS SPUTTERING THIN FILMS
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description	Ni-doped copper nitride films have been prepared by co-sputtering of Ni and Cu targets. The addition of Ni to Cu3N films reduced the intensity of the (111) diffraction peak, and lead a little angular shifts of the peaks. The films showed a large difference in reflectance in the infrared and visible before and after thermal decomposition, which is applicable to optical recording media. The films change from a semiconductor to a conductor with the increased ratio of Ni in Cu3N films.
doi_str_mv	10.4028/www.scientific.net/KEM.636.29
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subjects	Copper COPPER NITRIDE DEPOSITION Diffraction Infrared Nickel Nitrides Reflectivity SEMICONDUCTORS SPUTTERING THIN FILMS
title	The Study of Nickel on Copper Nitride Thin Films Deposited by Magnetron Sputtering
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