Advanced Nanocluster Ion Source Based on High-Power Impulse Magnetron Sputtering and Time-Resolved Measurements of Nanocluster Formation

We developed a new nanocluster (NC) ion source based on the high-power impulse magnetron sputtering (HiPIMS) technique coupled with a gas flow cell reactor. Silver NC anions (Ag n –) with a maximum intensity of 5.5 nA (Ag11 –) are generated with the size ranging from the atomic anion to the 70-mer,...

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Veröffentlicht in:The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory Molecules, spectroscopy, kinetics, environment, & general theory, 2013-10, Vol.117 (40), p.10211-10217
Hauptverfasser: Zhang, Chuhang, Tsunoyama, Hironori, Akatsuka, Hiroki, Sekiya, Hiroki, Nagase, Tomomi, Nakajima, Atsushi
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container_end_page 10217
container_issue 40
container_start_page 10211
container_title The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory
container_volume 117
creator Zhang, Chuhang
Tsunoyama, Hironori
Akatsuka, Hiroki
Sekiya, Hiroki
Nagase, Tomomi
Nakajima, Atsushi
description We developed a new nanocluster (NC) ion source based on the high-power impulse magnetron sputtering (HiPIMS) technique coupled with a gas flow cell reactor. Silver NC anions (Ag n –) with a maximum intensity of 5.5 nA (Ag11 –) are generated with the size ranging from the atomic anion to the 70-mer, which is well-controlled by simply adjusting the peak power and repetition rate of the HiPIMS. By time-resolved density profiles of Ag n –, we find that the ion beam generated by HiPIMS is characterized by individual 100 ms duration “bunches” below a repetition rate of 10 Hz, which is well-thermalized with a group velocity of 5 m/s. The high intensity of the NCs is attributable to the high ionization fraction by this HiPIMS ion source, while the underlying mechanism of the flexible size tuning of the ion source is understood by time-resolved mass spectrometry coupled with the sequential growth mechanism; the increment of the density of the target species in the bunches with the peak power and the overlapping of the bunches with the repetition rate cause the formation of large NCs.
doi_str_mv 10.1021/jp406521v
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subjects Anions
Atomic and molecular clusters
Atomic and molecular physics
Charged clusters
Cross-disciplinary physics: materials science
rheology
Density
Exact sciences and technology
Formations
Impulses
Ion sources
Magnetron sputtering
Materials science
Nanoscale materials and structures: fabrication and characterization
Nanostructure
Other topics in nanoscale materials and structures
Physics
Repetition
Studies of special atoms, molecules and their ions
clusters
title Advanced Nanocluster Ion Source Based on High-Power Impulse Magnetron Sputtering and Time-Resolved Measurements of Nanocluster Formation
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