Dimensionally controlled complex 3D sub-micron pattern fabrication by single step dual diffuser lithography (DDL)

[Display omitted] •A single step fabrication of complex 3D sub-micron structures.•Diffusion of collimated UV light at wider angles by dual diffuser.•Dimensional control over patterns by change in exposure energy.•Demonstrated fabrication of sub-micron microlens and nm size microtips. This article pr...

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Veröffentlicht in:	Microelectronic engineering 2015-08, Vol.143, p.25-30
Hauptverfasser:	Hafeez, Hassan, Ryu, Heon-Yul, An, Il Sin, Oh, Hye-Keun, Ahn, Jin-Ho, Park, Jin-Goo
Format:	Artikel
Sprache:	eng
Schlagworte:	Diffusers Diffusion Dual diffuser lithography Exposure Lithography Microfabrication Microlens Microstructure Microtips Photolithography Scanning electron microscopy Three dimensional
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