Nanosoldering Carbon Nanotube Junctions by Local Chemical Vapor Deposition for Improved Device Performance

The performance of carbon nanotube network (CNN) devices is usually limited by the high resistance of individual nanotube junctions (NJs). We present a novel method to reduce this resistance through a nanoscale chemical vapor deposition (CVD) process. By passing current through the devices in the pr...

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Veröffentlicht in:	Nano letters 2013-12, Vol.13 (12), p.5844-5850
Hauptverfasser:	Do, Jae-Won, Estrada, David, Xie, Xu, Chang, Noel N, Mallek, Justin, Girolami, Gregory S, Rogers, John A, Pop, Eric, Lyding, Joseph W
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Carbon nanotubes Chemical vapor deposition Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Deposition Devices Electronics Exact sciences and technology Joule heating Materials science Metals - chemistry Methods of deposition of films and coatings film growth and epitaxy Molecular electronics, nanoelectronics Nanocrystalline materials Nanoscale materials and structures: fabrication and characterization Nanostructure Nanotechnology Nanotubes Nanotubes, Carbon - chemistry Physics Precursors Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Surface Properties Temperature Work functions
Online-Zugang:	Volltext
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