Gas-phase dynamics in graphene growth by chemical vapour deposition
Chemical vapour deposition on a Cu substrate is becoming a very important approach to obtain high quality graphene samples. Previous studies of graphene growth on Cu mainly focus on surface processes. However, recent experiments suggest that gas-phase dynamics also plays an important role in graphen...
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| Veröffentlicht in: | Physical chemistry chemical physics : PCCP 2015-09, Vol.17 (35), p.22832-22836 |
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| container_issue | 35 |
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| container_title | Physical chemistry chemical physics : PCCP |
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| creator | Li, Gan Huang, Sheng-Hong Li, Zhenyu |
| description | Chemical vapour deposition on a Cu substrate is becoming a very important approach to obtain high quality graphene samples. Previous studies of graphene growth on Cu mainly focus on surface processes. However, recent experiments suggest that gas-phase dynamics also plays an important role in graphene growth. In this article, gas-phase processes are systematically studied using computational fluid dynamics. Our simulations clearly show that graphene growth is limited by mass transport under ambient pressures while it is limited by surface reactions under low pressures. The carbon deposition rate at different positions in the tube furnace and the concentration of different gas phase species are calculated. Our results confirm that the previously realized graphene thickness control by changing the position of the Cu foil is a result of gas-phase methane decomposition reactions. |
| doi_str_mv | 10.1039/c5cp02301g |
| format | Article |
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Previous studies of graphene growth on Cu mainly focus on surface processes. However, recent experiments suggest that gas-phase dynamics also plays an important role in graphene growth. In this article, gas-phase processes are systematically studied using computational fluid dynamics. Our simulations clearly show that graphene growth is limited by mass transport under ambient pressures while it is limited by surface reactions under low pressures. The carbon deposition rate at different positions in the tube furnace and the concentration of different gas phase species are calculated. Our results confirm that the previously realized graphene thickness control by changing the position of the Cu foil is a result of gas-phase methane decomposition reactions.</description><identifier>ISSN: 1463-9076</identifier><identifier>EISSN: 1463-9084</identifier><identifier>DOI: 10.1039/c5cp02301g</identifier><identifier>PMID: 26265486</identifier><language>eng</language><publisher>England</publisher><subject>Carbon ; Chemical vapor deposition ; Computer simulation ; Copper ; Dynamics ; Foils ; Graphene ; Surface reactions</subject><ispartof>Physical chemistry chemical physics : PCCP, 2015-09, Vol.17 (35), p.22832-22836</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c361t-b01247ec8f2a26804beb158663bcac2654b78cec829a9120b5d7cdc594e56d423</citedby><cites>FETCH-LOGICAL-c361t-b01247ec8f2a26804beb158663bcac2654b78cec829a9120b5d7cdc594e56d423</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/26265486$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Li, Gan</creatorcontrib><creatorcontrib>Huang, Sheng-Hong</creatorcontrib><creatorcontrib>Li, Zhenyu</creatorcontrib><title>Gas-phase dynamics in graphene growth by chemical vapour deposition</title><title>Physical chemistry chemical physics : PCCP</title><addtitle>Phys Chem Chem Phys</addtitle><description>Chemical vapour deposition on a Cu substrate is becoming a very important approach to obtain high quality graphene samples. 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Our results confirm that the previously realized graphene thickness control by changing the position of the Cu foil is a result of gas-phase methane decomposition reactions.</description><subject>Carbon</subject><subject>Chemical vapor deposition</subject><subject>Computer simulation</subject><subject>Copper</subject><subject>Dynamics</subject><subject>Foils</subject><subject>Graphene</subject><subject>Surface reactions</subject><issn>1463-9076</issn><issn>1463-9084</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><recordid>eNqNkEtLw0AUhQdRbK1u_AEySxGid96TpQStQkEXug4zk2kTyctMouTfm9ratat74HwcLh9ClwRuCbD4zgnXAmVANkdoTrhkUQyaHx-ykjN0FsIHABBB2CmaUUml4FrOUbI0IWpzEzzOxtpUhQu4qPGmM23uaz-F5rvPsR2xy_3UmhJ_mbYZOpz5tglFXzT1OTpZmzL4i_1doPfHh7fkKVq9LJ-T-1XkmCR9ZIFQrrzTa2qo1MCtt0RoKZl1xm0fskq7qaexiQkFKzLlMidi7oXMOGULdL3bbbvmc_ChT6siOF-WpvbNEFKiOFcUpNL_QEEJoYiECb3Zoa5rQuj8Om27ojLdmBJIt37TRCSvv36XE3y13x1s5bMD-ieU_QCAtnSO</recordid><startdate>20150921</startdate><enddate>20150921</enddate><creator>Li, Gan</creator><creator>Huang, Sheng-Hong</creator><creator>Li, Zhenyu</creator><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20150921</creationdate><title>Gas-phase dynamics in graphene growth by chemical vapour deposition</title><author>Li, Gan ; Huang, Sheng-Hong ; Li, Zhenyu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c361t-b01247ec8f2a26804beb158663bcac2654b78cec829a9120b5d7cdc594e56d423</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>Carbon</topic><topic>Chemical vapor deposition</topic><topic>Computer simulation</topic><topic>Copper</topic><topic>Dynamics</topic><topic>Foils</topic><topic>Graphene</topic><topic>Surface reactions</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Li, Gan</creatorcontrib><creatorcontrib>Huang, Sheng-Hong</creatorcontrib><creatorcontrib>Li, Zhenyu</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Physical chemistry chemical physics : PCCP</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Li, Gan</au><au>Huang, Sheng-Hong</au><au>Li, Zhenyu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Gas-phase dynamics in graphene growth by chemical vapour deposition</atitle><jtitle>Physical chemistry chemical physics : PCCP</jtitle><addtitle>Phys Chem Chem Phys</addtitle><date>2015-09-21</date><risdate>2015</risdate><volume>17</volume><issue>35</issue><spage>22832</spage><epage>22836</epage><pages>22832-22836</pages><issn>1463-9076</issn><eissn>1463-9084</eissn><abstract>Chemical vapour deposition on a Cu substrate is becoming a very important approach to obtain high quality graphene samples. 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| identifier | ISSN: 1463-9076 |
| ispartof | Physical chemistry chemical physics : PCCP, 2015-09, Vol.17 (35), p.22832-22836 |
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| language | eng |
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| source | Royal Society Of Chemistry Journals 2008-; Alma/SFX Local Collection |
| subjects | Carbon Chemical vapor deposition Computer simulation Copper Dynamics Foils Graphene Surface reactions |
| title | Gas-phase dynamics in graphene growth by chemical vapour deposition |
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