Preparation of porous glass films using phase separation phenomenon and growth behavior of phase-separated structure

We report the preparation of porous glass films on transparent conductive oxide-coated glass substrates using the phase separation phenomena and the growth behavior of the phase-separated structure. We confirmed that the etched glass films are composed of microscale pores, a three-dimensional porous...

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Veröffentlicht in:Journal of materials science 2013-12, Vol.48 (23), p.8068-8076
Hauptverfasser: Hwang, C., Kim, J., Ryu, Bong Ki, Takebe, H.
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container_title Journal of materials science
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creator Hwang, C.
Kim, J.
Ryu, Bong Ki
Takebe, H.
description We report the preparation of porous glass films on transparent conductive oxide-coated glass substrates using the phase separation phenomena and the growth behavior of the phase-separated structure. We confirmed that the etched glass films are composed of microscale pores, a three-dimensional porous framework of SiO 2 -rich phase with widths of about 40–300 nm, and a thin surface layer of about 40–90 nm thick. The SiO 2 -rich phase grew by diffusion-dominated growth and then viscous flow-dominated growth.
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subjects Characterization and Evaluation of Materials
Chemistry and Materials Science
Classical Mechanics
Crystallography and Scattering Methods
Diffusion
glass
Glass substrates
Materials Science
Phase separation
Polymer Sciences
porosity
separation
silica
Silicon dioxide
Solid Mechanics
Surface layers
viscosity
Viscous flow
title Preparation of porous glass films using phase separation phenomenon and growth behavior of phase-separated structure
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