Growth of Pt by surface limited redox replacement of underpotentially deposited hydrogen

[Display omitted] ► Pt films deposition by SLRR of H UPD was developed and tested on Pt and Pd substrates. ► Roughness of grown Pt films is lower compared to the ones deposited potentiostatically. ► The proposed approach enables contamination free deposition of Pt in quasi 2D mode. ► Pt films on Pd...

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Veröffentlicht in:	Electrochimica acta 2013-12, Vol.112, p.813-823
Hauptverfasser:	Nutariya, J., Fayette, M., Dimitrov, N., Vasiljevic, N.
Format:	Artikel
Sprache:	eng
Schlagworte:	Deposition Formic acid oxidation Gold Hydrogen UPD Microbalances Nanostructure Palladium Platinum Pt electrodeposition Roughness SLRR Thin films
Online-Zugang:	Volltext
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