An Unconventional Route to Hierarchically Ordered Block Copolymers on a Gradient Patterned Surface through Controlled Evaporative Self-Assembly

A chemically patterned surface was formed by controlled evaporative self‐assembly of concentric polymer stripes, followed by the removal of weakly deposited polymer, giving ultrathin polymer stripes with a width gradient on the Si substrate (see picture). A thin film of diblock copolymer hierarchica...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Angewandte Chemie International Edition 2013-01, Vol.52 (4), p.1122-1127
Hauptverfasser:	Byun, Myunghwan, Han, Wei, Li, Bo, Xin, Xukai, Lin, Zhiqun
Format:	Artikel
Sprache:	eng
Schlagworte:	Arrays Block copolymers controlled evaporative self-assembly Copolymers Deposition Evaporative hierarchically ordered structures Self assembly Silicon substrates surface patterning Thin films
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page	1127
container_issue	4
container_start_page	1122
container_title	Angewandte Chemie International Edition
container_volume	52
creator	Byun, Myunghwan Han, Wei Li, Bo Xin, Xukai Lin, Zhiqun
description	A chemically patterned surface was formed by controlled evaporative self‐assembly of concentric polymer stripes, followed by the removal of weakly deposited polymer, giving ultrathin polymer stripes with a width gradient on the Si substrate (see picture). A thin film of diblock copolymer hierarchically self‐assembled on the ultrathin polymer stripes, giving arrays of nanocylinders perpendicular to the surface of the film.
doi_str_mv	10.1002/anie.201208421
format	Article
fullrecord	<record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1701061877</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1701061877</sourcerecordid><originalsourceid>FETCH-LOGICAL-c5101-c7da499d2baedfa85d84044b962eaa5bb07ce854f0d8447848ee17e6411bfcbe3</originalsourceid><addsrcrecordid>eNqFkU1vEzEQhlcIREvhyhFZ4sJlg7927T2GkKaFqEWUCm6W1ztLtnXsYO8G9lfwl3GUNqq49DQjzfM-h3mz7DXBE4Ixfa9dBxOKCcWSU_IkOyYFJTkTgj1NO2csF7IgR9mLGG8SLyUun2dHlFFaFAwfZ3-nDl07490WXN95py366oceUO_RWQdBB7PqjLZ2RJehgQAN-mC9uUUzv_F2XEOIyDuk0SLopksO9EX3PQSXwKshtNok1Sr44ecqRVwfvLXpNN_qjQ-677aArsC2-TRGWNd2fJk9a7WN8OpunmTXp_Nvs7N8ebk4n02XuSkIJrkRjeZV1dBaQ9NqWTSSY87rqqSgdVHXWBiQBW9xOnAhuQQgAkpOSN2aGthJ9m7v3QT_a4DYq3UXDVirHfghKiIwwSWR6ZGPolSwQmJS4oS-_Q-98UNIT91RZcUFkRVP1GRPmeBjDNCqTejWOoyKYLVrVe1aVYdWU-DNnXao19Ac8PsaE1Dtgd-dhfERnZpenM8fyvN9tos9_DlkdbhVpWCiUN8vFurHKf-8rD7N1Ef2D_zQv1E</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1269471894</pqid></control><display><type>article</type><title>An Unconventional Route to Hierarchically Ordered Block Copolymers on a Gradient Patterned Surface through Controlled Evaporative Self-Assembly</title><source>Wiley Online Library</source><creator>Byun, Myunghwan ; Han, Wei ; Li, Bo ; Xin, Xukai ; Lin, Zhiqun</creator><creatorcontrib>Byun, Myunghwan ; Han, Wei ; Li, Bo ; Xin, Xukai ; Lin, Zhiqun</creatorcontrib><description>A chemically patterned surface was formed by controlled evaporative self‐assembly of concentric polymer stripes, followed by the removal of weakly deposited polymer, giving ultrathin polymer stripes with a width gradient on the Si substrate (see picture). A thin film of diblock copolymer hierarchically self‐assembled on the ultrathin polymer stripes, giving arrays of nanocylinders perpendicular to the surface of the film.</description><edition>International ed. in English</edition><identifier>ISSN: 1433-7851</identifier><identifier>EISSN: 1521-3773</identifier><identifier>DOI: 10.1002/anie.201208421</identifier><identifier>PMID: 23225530</identifier><identifier>CODEN: ACIEAY</identifier><language>eng</language><publisher>Weinheim: WILEY-VCH Verlag</publisher><subject>Arrays ; Block copolymers ; controlled evaporative self-assembly ; Copolymers ; Deposition ; Evaporative ; hierarchically ordered structures ; Self assembly ; Silicon substrates ; surface patterning ; Thin films</subject><ispartof>Angewandte Chemie International Edition, 2013-01, Vol.52 (4), p.1122-1127</ispartof><rights>Copyright © 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim</rights><rights>Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c5101-c7da499d2baedfa85d84044b962eaa5bb07ce854f0d8447848ee17e6411bfcbe3</citedby><cites>FETCH-LOGICAL-c5101-c7da499d2baedfa85d84044b962eaa5bb07ce854f0d8447848ee17e6411bfcbe3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fanie.201208421$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fanie.201208421$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,776,780,1411,27901,27902,45550,45551</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/23225530$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Byun, Myunghwan</creatorcontrib><creatorcontrib>Han, Wei</creatorcontrib><creatorcontrib>Li, Bo</creatorcontrib><creatorcontrib>Xin, Xukai</creatorcontrib><creatorcontrib>Lin, Zhiqun</creatorcontrib><title>An Unconventional Route to Hierarchically Ordered Block Copolymers on a Gradient Patterned Surface through Controlled Evaporative Self-Assembly</title><title>Angewandte Chemie International Edition</title><addtitle>Angew. Chem. Int. Ed</addtitle><description>A chemically patterned surface was formed by controlled evaporative self‐assembly of concentric polymer stripes, followed by the removal of weakly deposited polymer, giving ultrathin polymer stripes with a width gradient on the Si substrate (see picture). A thin film of diblock copolymer hierarchically self‐assembled on the ultrathin polymer stripes, giving arrays of nanocylinders perpendicular to the surface of the film.</description><subject>Arrays</subject><subject>Block copolymers</subject><subject>controlled evaporative self-assembly</subject><subject>Copolymers</subject><subject>Deposition</subject><subject>Evaporative</subject><subject>hierarchically ordered structures</subject><subject>Self assembly</subject><subject>Silicon substrates</subject><subject>surface patterning</subject><subject>Thin films</subject><issn>1433-7851</issn><issn>1521-3773</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNqFkU1vEzEQhlcIREvhyhFZ4sJlg7927T2GkKaFqEWUCm6W1ztLtnXsYO8G9lfwl3GUNqq49DQjzfM-h3mz7DXBE4Ixfa9dBxOKCcWSU_IkOyYFJTkTgj1NO2csF7IgR9mLGG8SLyUun2dHlFFaFAwfZ3-nDl07490WXN95py366oceUO_RWQdBB7PqjLZ2RJehgQAN-mC9uUUzv_F2XEOIyDuk0SLopksO9EX3PQSXwKshtNok1Sr44ecqRVwfvLXpNN_qjQ-677aArsC2-TRGWNd2fJk9a7WN8OpunmTXp_Nvs7N8ebk4n02XuSkIJrkRjeZV1dBaQ9NqWTSSY87rqqSgdVHXWBiQBW9xOnAhuQQgAkpOSN2aGthJ9m7v3QT_a4DYq3UXDVirHfghKiIwwSWR6ZGPolSwQmJS4oS-_Q-98UNIT91RZcUFkRVP1GRPmeBjDNCqTejWOoyKYLVrVe1aVYdWU-DNnXao19Ac8PsaE1Dtgd-dhfERnZpenM8fyvN9tos9_DlkdbhVpWCiUN8vFurHKf-8rD7N1Ef2D_zQv1E</recordid><startdate>20130121</startdate><enddate>20130121</enddate><creator>Byun, Myunghwan</creator><creator>Han, Wei</creator><creator>Li, Bo</creator><creator>Xin, Xukai</creator><creator>Lin, Zhiqun</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><general>Wiley Subscription Services, Inc</general><scope>BSCLL</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7TM</scope><scope>K9.</scope><scope>7X8</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20130121</creationdate><title>An Unconventional Route to Hierarchically Ordered Block Copolymers on a Gradient Patterned Surface through Controlled Evaporative Self-Assembly</title><author>Byun, Myunghwan ; Han, Wei ; Li, Bo ; Xin, Xukai ; Lin, Zhiqun</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c5101-c7da499d2baedfa85d84044b962eaa5bb07ce854f0d8447848ee17e6411bfcbe3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Arrays</topic><topic>Block copolymers</topic><topic>controlled evaporative self-assembly</topic><topic>Copolymers</topic><topic>Deposition</topic><topic>Evaporative</topic><topic>hierarchically ordered structures</topic><topic>Self assembly</topic><topic>Silicon substrates</topic><topic>surface patterning</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Byun, Myunghwan</creatorcontrib><creatorcontrib>Han, Wei</creatorcontrib><creatorcontrib>Li, Bo</creatorcontrib><creatorcontrib>Xin, Xukai</creatorcontrib><creatorcontrib>Lin, Zhiqun</creatorcontrib><collection>Istex</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>Nucleic Acids Abstracts</collection><collection>ProQuest Health & Medical Complete (Alumni)</collection><collection>MEDLINE - Academic</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Angewandte Chemie International Edition</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Byun, Myunghwan</au><au>Han, Wei</au><au>Li, Bo</au><au>Xin, Xukai</au><au>Lin, Zhiqun</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>An Unconventional Route to Hierarchically Ordered Block Copolymers on a Gradient Patterned Surface through Controlled Evaporative Self-Assembly</atitle><jtitle>Angewandte Chemie International Edition</jtitle><addtitle>Angew. Chem. Int. Ed</addtitle><date>2013-01-21</date><risdate>2013</risdate><volume>52</volume><issue>4</issue><spage>1122</spage><epage>1127</epage><pages>1122-1127</pages><issn>1433-7851</issn><eissn>1521-3773</eissn><coden>ACIEAY</coden><abstract>A chemically patterned surface was formed by controlled evaporative self‐assembly of concentric polymer stripes, followed by the removal of weakly deposited polymer, giving ultrathin polymer stripes with a width gradient on the Si substrate (see picture). A thin film of diblock copolymer hierarchically self‐assembled on the ultrathin polymer stripes, giving arrays of nanocylinders perpendicular to the surface of the film.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><pmid>23225530</pmid><doi>10.1002/anie.201208421</doi><tpages>6</tpages><edition>International ed. in English</edition></addata></record>
fulltext	fulltext
identifier	ISSN: 1433-7851
ispartof	Angewandte Chemie International Edition, 2013-01, Vol.52 (4), p.1122-1127
issn	1433-7851 1521-3773
language	eng
recordid	cdi_proquest_miscellaneous_1701061877
source	Wiley Online Library
subjects	Arrays Block copolymers controlled evaporative self-assembly Copolymers Deposition Evaporative hierarchically ordered structures Self assembly Silicon substrates surface patterning Thin films
title	An Unconventional Route to Hierarchically Ordered Block Copolymers on a Gradient Patterned Surface through Controlled Evaporative Self-Assembly
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-04T15%3A55%3A10IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=An%20Unconventional%20Route%20to%20Hierarchically%20Ordered%20Block%20Copolymers%20on%20a%20Gradient%20Patterned%20Surface%20through%20Controlled%20Evaporative%20Self-Assembly&rft.jtitle=Angewandte%20Chemie%20International%20Edition&rft.au=Byun,%20Myunghwan&rft.date=2013-01-21&rft.volume=52&rft.issue=4&rft.spage=1122&rft.epage=1127&rft.pages=1122-1127&rft.issn=1433-7851&rft.eissn=1521-3773&rft.coden=ACIEAY&rft_id=info:doi/10.1002/anie.201208421&rft_dat=%3Cproquest_cross%3E1701061877%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1269471894&rft_id=info:pmid/23225530&rfr_iscdi=true