Atomic-level modeling and computation of intergranular glassy film in high-purity Si3N4 ceramics

A model for intergranular glassy film (IGF) at grain boundaries in Si3N4 is proposed. The model agrees well with experimental information available. Although it has periodicity, atomistic simulations using the model enable to elucidate the rationale for the presence of the IGF. Amorphous models obta...

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Veröffentlicht in:Journal of the European Ceramic Society 2012-06, Vol.32 (7), p.1301-1311
Hauptverfasser: Yoshiya, Masato, Tanaka, Isao, Adachi, Hirohiko
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Sprache:eng
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