Slow Relaxation Processes in CCTO Detected by Capacitance Versus Voltage Curves

The temperature and frequency dependence of capacitance versus voltage (C–V) curves was investigated for ceramic CaCu3Ti4O12 samples sintered in atmospheres of vacuum, air and oxygen, respectively. A drastic capacitance rise at higher dc voltages and low ac frequencies was observed for all these CaC...

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Veröffentlicht in:Journal of the American Ceramic Society 2013-01, Vol.96 (1), p.253-258
Hauptverfasser: Luo, Xiao Jing, Yang, Chang Ping, Song, Xue Ping, Tang, Shao-Long, Xiao, Hai-Bo, Bärner, Klaus Herrmann Otto
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container_issue 1
container_start_page 253
container_title Journal of the American Ceramic Society
container_volume 96
creator Luo, Xiao Jing
Yang, Chang Ping
Song, Xue Ping
Tang, Shao-Long
Xiao, Hai-Bo
Bärner, Klaus Herrmann Otto
description The temperature and frequency dependence of capacitance versus voltage (C–V) curves was investigated for ceramic CaCu3Ti4O12 samples sintered in atmospheres of vacuum, air and oxygen, respectively. A drastic capacitance rise at higher dc voltages and low ac frequencies was observed for all these CaCu3Ti4O12CCTO samples, and it is especially strong for the sample sintered in vacuum, which has not been found previously. The shape as well as the asymmetry of the C–V curves suggest that the dielectric behavior is related to charged trap states. It also indicates that a slow relaxation process, which is strongly correlated with the re‐positioning of oxygen vacancies related trap charges, takes place in CCTO. The main trap charge relaxation process is thought to occur between the boundaries perpendicular and parallel to the external electric field, and the anisotropy of the defect dipoles provide the possibilities for trap charge repositioning which maybe the reason of the huge dielectric constant.
doi_str_mv 10.1111/jace.12042
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1692355108</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2861161311</sourcerecordid><originalsourceid>FETCH-LOGICAL-c4382-4e5a305ab678a0d38de972eba9f0e57dd431a969af41e9d8d03238492ac566483</originalsourceid><addsrcrecordid>eNqNkc1v00AQxVcIJELppX_BSlwQkst-e_dYOaUFRaTqJ7fVZD1BDq4ddu22-e-7IdADh6pzGY30e0968wg54OyQ5_m8goCHXDAlXpEJ15oXwnHzmkwYY6IorWBvybuUVvnkzqoJmV-0_T09xxYeYGj6jp7FPmBKmGjT0aq6nNMpDhgGrOliQytYQ2gG6ALSa4xpTPS6bwf4ibQa4x2m9-TNEtqE-3_3Hrn6cnxZnRaz-cnX6mhWBCWtKBRqkEzDwpQWWC1tja4UuAC3ZKjLulaSgzMOloqjq23NpJBWOQFBG6Os3CMfd77r2P8eMQ3-tkkB2xY67MfkuXFC5vzsBWi2FloyyV-Acm1UyViZ0Q__oat-jF3O7LnIqdj2xZn6tKNC7FOKuPTr2NxC3HjO_LYxv23M_2ksw3wH3zctbp4h_bej6vifpthpmjTgw5MG4i9vSllqf_P9xM-m0x9yqq038hHhDKPy</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1267800001</pqid></control><display><type>article</type><title>Slow Relaxation Processes in CCTO Detected by Capacitance Versus Voltage Curves</title><source>Access via Wiley Online Library</source><creator>Luo, Xiao Jing ; Yang, Chang Ping ; Song, Xue Ping ; Tang, Shao-Long ; Xiao, Hai-Bo ; Bärner, Klaus Herrmann Otto</creator><contributor>Varela, J. A. ; Varela, J. A.</contributor><creatorcontrib>Luo, Xiao Jing ; Yang, Chang Ping ; Song, Xue Ping ; Tang, Shao-Long ; Xiao, Hai-Bo ; Bärner, Klaus Herrmann Otto ; Varela, J. A. ; Varela, J. A.</creatorcontrib><description>The temperature and frequency dependence of capacitance versus voltage (C–V) curves was investigated for ceramic CaCu3Ti4O12 samples sintered in atmospheres of vacuum, air and oxygen, respectively. A drastic capacitance rise at higher dc voltages and low ac frequencies was observed for all these CaCu3Ti4O12CCTO samples, and it is especially strong for the sample sintered in vacuum, which has not been found previously. The shape as well as the asymmetry of the C–V curves suggest that the dielectric behavior is related to charged trap states. It also indicates that a slow relaxation process, which is strongly correlated with the re‐positioning of oxygen vacancies related trap charges, takes place in CCTO. The main trap charge relaxation process is thought to occur between the boundaries perpendicular and parallel to the external electric field, and the anisotropy of the defect dipoles provide the possibilities for trap charge repositioning which maybe the reason of the huge dielectric constant.</description><identifier>ISSN: 0002-7820</identifier><identifier>EISSN: 1551-2916</identifier><identifier>DOI: 10.1111/jace.12042</identifier><identifier>CODEN: JACTAW</identifier><language>eng</language><publisher>Columbus: Blackwell Publishing Ltd</publisher><subject>Anisotropy ; CAPACITANCE ; CERAMICS ; Charge ; Charge (electric) ; COPPER OXIDE ; Correlation analysis ; DIELECTRIC CONSTANT ; Dielectric properties ; Electric charge ; Electric currents ; Electric fields ; Electric potential ; MAGNETIC FIELD ; Oxygen ; SINTERING ; Temperature ; VOLTAGE</subject><ispartof>Journal of the American Ceramic Society, 2013-01, Vol.96 (1), p.253-258</ispartof><rights>2012 The American Ceramic Society</rights><rights>Copyright American Ceramic Society Jan 2013</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c4382-4e5a305ab678a0d38de972eba9f0e57dd431a969af41e9d8d03238492ac566483</citedby><cites>FETCH-LOGICAL-c4382-4e5a305ab678a0d38de972eba9f0e57dd431a969af41e9d8d03238492ac566483</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1111%2Fjace.12042$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1111%2Fjace.12042$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1417,27924,27925,45574,45575</link.rule.ids></links><search><contributor>Varela, J. A.</contributor><contributor>Varela, J. A.</contributor><creatorcontrib>Luo, Xiao Jing</creatorcontrib><creatorcontrib>Yang, Chang Ping</creatorcontrib><creatorcontrib>Song, Xue Ping</creatorcontrib><creatorcontrib>Tang, Shao-Long</creatorcontrib><creatorcontrib>Xiao, Hai-Bo</creatorcontrib><creatorcontrib>Bärner, Klaus Herrmann Otto</creatorcontrib><title>Slow Relaxation Processes in CCTO Detected by Capacitance Versus Voltage Curves</title><title>Journal of the American Ceramic Society</title><addtitle>J. Am. Ceram. Soc</addtitle><description>The temperature and frequency dependence of capacitance versus voltage (C–V) curves was investigated for ceramic CaCu3Ti4O12 samples sintered in atmospheres of vacuum, air and oxygen, respectively. A drastic capacitance rise at higher dc voltages and low ac frequencies was observed for all these CaCu3Ti4O12CCTO samples, and it is especially strong for the sample sintered in vacuum, which has not been found previously. The shape as well as the asymmetry of the C–V curves suggest that the dielectric behavior is related to charged trap states. It also indicates that a slow relaxation process, which is strongly correlated with the re‐positioning of oxygen vacancies related trap charges, takes place in CCTO. The main trap charge relaxation process is thought to occur between the boundaries perpendicular and parallel to the external electric field, and the anisotropy of the defect dipoles provide the possibilities for trap charge repositioning which maybe the reason of the huge dielectric constant.</description><subject>Anisotropy</subject><subject>CAPACITANCE</subject><subject>CERAMICS</subject><subject>Charge</subject><subject>Charge (electric)</subject><subject>COPPER OXIDE</subject><subject>Correlation analysis</subject><subject>DIELECTRIC CONSTANT</subject><subject>Dielectric properties</subject><subject>Electric charge</subject><subject>Electric currents</subject><subject>Electric fields</subject><subject>Electric potential</subject><subject>MAGNETIC FIELD</subject><subject>Oxygen</subject><subject>SINTERING</subject><subject>Temperature</subject><subject>VOLTAGE</subject><issn>0002-7820</issn><issn>1551-2916</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNqNkc1v00AQxVcIJELppX_BSlwQkst-e_dYOaUFRaTqJ7fVZD1BDq4ddu22-e-7IdADh6pzGY30e0968wg54OyQ5_m8goCHXDAlXpEJ15oXwnHzmkwYY6IorWBvybuUVvnkzqoJmV-0_T09xxYeYGj6jp7FPmBKmGjT0aq6nNMpDhgGrOliQytYQ2gG6ALSa4xpTPS6bwf4ibQa4x2m9-TNEtqE-3_3Hrn6cnxZnRaz-cnX6mhWBCWtKBRqkEzDwpQWWC1tja4UuAC3ZKjLulaSgzMOloqjq23NpJBWOQFBG6Os3CMfd77r2P8eMQ3-tkkB2xY67MfkuXFC5vzsBWi2FloyyV-Acm1UyViZ0Q__oat-jF3O7LnIqdj2xZn6tKNC7FOKuPTr2NxC3HjO_LYxv23M_2ksw3wH3zctbp4h_bej6vifpthpmjTgw5MG4i9vSllqf_P9xM-m0x9yqq038hHhDKPy</recordid><startdate>201301</startdate><enddate>201301</enddate><creator>Luo, Xiao Jing</creator><creator>Yang, Chang Ping</creator><creator>Song, Xue Ping</creator><creator>Tang, Shao-Long</creator><creator>Xiao, Hai-Bo</creator><creator>Bärner, Klaus Herrmann Otto</creator><general>Blackwell Publishing Ltd</general><general>Wiley Subscription Services, Inc</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope><scope>H8G</scope></search><sort><creationdate>201301</creationdate><title>Slow Relaxation Processes in CCTO Detected by Capacitance Versus Voltage Curves</title><author>Luo, Xiao Jing ; Yang, Chang Ping ; Song, Xue Ping ; Tang, Shao-Long ; Xiao, Hai-Bo ; Bärner, Klaus Herrmann Otto</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c4382-4e5a305ab678a0d38de972eba9f0e57dd431a969af41e9d8d03238492ac566483</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Anisotropy</topic><topic>CAPACITANCE</topic><topic>CERAMICS</topic><topic>Charge</topic><topic>Charge (electric)</topic><topic>COPPER OXIDE</topic><topic>Correlation analysis</topic><topic>DIELECTRIC CONSTANT</topic><topic>Dielectric properties</topic><topic>Electric charge</topic><topic>Electric currents</topic><topic>Electric fields</topic><topic>Electric potential</topic><topic>MAGNETIC FIELD</topic><topic>Oxygen</topic><topic>SINTERING</topic><topic>Temperature</topic><topic>VOLTAGE</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Luo, Xiao Jing</creatorcontrib><creatorcontrib>Yang, Chang Ping</creatorcontrib><creatorcontrib>Song, Xue Ping</creatorcontrib><creatorcontrib>Tang, Shao-Long</creatorcontrib><creatorcontrib>Xiao, Hai-Bo</creatorcontrib><creatorcontrib>Bärner, Klaus Herrmann Otto</creatorcontrib><collection>Istex</collection><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Copper Technical Reference Library</collection><jtitle>Journal of the American Ceramic Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Luo, Xiao Jing</au><au>Yang, Chang Ping</au><au>Song, Xue Ping</au><au>Tang, Shao-Long</au><au>Xiao, Hai-Bo</au><au>Bärner, Klaus Herrmann Otto</au><au>Varela, J. A.</au><au>Varela, J. A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Slow Relaxation Processes in CCTO Detected by Capacitance Versus Voltage Curves</atitle><jtitle>Journal of the American Ceramic Society</jtitle><addtitle>J. Am. Ceram. Soc</addtitle><date>2013-01</date><risdate>2013</risdate><volume>96</volume><issue>1</issue><spage>253</spage><epage>258</epage><pages>253-258</pages><issn>0002-7820</issn><eissn>1551-2916</eissn><coden>JACTAW</coden><abstract>The temperature and frequency dependence of capacitance versus voltage (C–V) curves was investigated for ceramic CaCu3Ti4O12 samples sintered in atmospheres of vacuum, air and oxygen, respectively. A drastic capacitance rise at higher dc voltages and low ac frequencies was observed for all these CaCu3Ti4O12CCTO samples, and it is especially strong for the sample sintered in vacuum, which has not been found previously. The shape as well as the asymmetry of the C–V curves suggest that the dielectric behavior is related to charged trap states. It also indicates that a slow relaxation process, which is strongly correlated with the re‐positioning of oxygen vacancies related trap charges, takes place in CCTO. The main trap charge relaxation process is thought to occur between the boundaries perpendicular and parallel to the external electric field, and the anisotropy of the defect dipoles provide the possibilities for trap charge repositioning which maybe the reason of the huge dielectric constant.</abstract><cop>Columbus</cop><pub>Blackwell Publishing Ltd</pub><doi>10.1111/jace.12042</doi><tpages>6</tpages></addata></record>
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subjects Anisotropy
CAPACITANCE
CERAMICS
Charge
Charge (electric)
COPPER OXIDE
Correlation analysis
DIELECTRIC CONSTANT
Dielectric properties
Electric charge
Electric currents
Electric fields
Electric potential
MAGNETIC FIELD
Oxygen
SINTERING
Temperature
VOLTAGE
title Slow Relaxation Processes in CCTO Detected by Capacitance Versus Voltage Curves
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T06%3A11%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Slow%20Relaxation%20Processes%20in%20CCTO%20Detected%20by%20Capacitance%20Versus%20Voltage%20Curves&rft.jtitle=Journal%20of%20the%20American%20Ceramic%20Society&rft.au=Luo,%20Xiao%20Jing&rft.date=2013-01&rft.volume=96&rft.issue=1&rft.spage=253&rft.epage=258&rft.pages=253-258&rft.issn=0002-7820&rft.eissn=1551-2916&rft.coden=JACTAW&rft_id=info:doi/10.1111/jace.12042&rft_dat=%3Cproquest_cross%3E2861161311%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1267800001&rft_id=info:pmid/&rfr_iscdi=true