Low-Resistance Metal Contacts for Nanocarbon/Cobalt Interconnects

Low-Resistance Metal Contacts for Nanocarbon/Cobalt Interconnects

Low-resistance metal contacts for CVD-nanocarbon (NC)/cobalt (Co) interconnects have been investigated among contact metals such as Ni, Ti, Au, and Cu. Contact resistivity was independent of contact area owing to low-resistance NC/Co interconnect structure. The lowest contact resistivity and superio...

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Veröffentlicht in:Japanese Journal of Applied Physics 2013-05, Vol.52 (5), p.05FD01-05FD01-4
Hauptverfasser: Ueno, Kazuyoshi, Takagi, Masashi, Yano, Hiroaki, Wakui, Taichi, Yamazaki, Yuichi, Sakuma, Naoshi, Kajita, Akihiro, Sakai, Tadashi
Format: Artikel
Sprache:eng
Schlagworte:
Adhesive strength
Cobalt
Copper
Electrical resistivity
Gold
Interconnections
Nanostructure
Nickel
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container_end_page 05FD01-4
container_issue 5
container_start_page 05FD01
container_title Japanese Journal of Applied Physics
container_volume 52
creator Ueno, Kazuyoshi
Takagi, Masashi
Yano, Hiroaki
Wakui, Taichi
Yamazaki, Yuichi
Sakuma, Naoshi
Kajita, Akihiro
Sakai, Tadashi
description Low-resistance metal contacts for CVD-nanocarbon (NC)/cobalt (Co) interconnects have been investigated among contact metals such as Ni, Ti, Au, and Cu. Contact resistivity was independent of contact area owing to low-resistance NC/Co interconnect structure. The lowest contact resistivity and superior adhesion were obtained from Ni. Although the factors for the low contact resistivity were not clear enough from the comparison of work-function difference and adhesion strength for the contact metals, Ni is a promising low-resistivity contact metal for CVD-NC interconnects in the future.
doi_str_mv 10.7567/JJAP.52.05FD01
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subjects Adhesive strength
Cobalt
Copper
Electrical resistivity
Gold
Interconnections
Nanostructure
Nickel
title Low-Resistance Metal Contacts for Nanocarbon/Cobalt Interconnects
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