High-In-content InGaAs quantum point contacts fabricated using focused ion beam system equipped with N sub(2) gas field ion source

Quantum point contacts (QPCs) in high-In-content InGaAs modulation-doped heterostructures fabricated using a focused ion beam (FIB) system equipped with a N sub(2) gas field ion source (GFIS) are demonstrated. The minimum physical size of the fabricated QPCs in this study is ~30 nm, which is smaller...

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Veröffentlicht in:Japanese Journal of Applied Physics 2014-01, Vol.53 (11), p.118002-1-118002-3
Hauptverfasser: Akabori, Masashi, Hidaka, Shiro, Yamada, Syoji, Kozakai, Tomokazu, Matsuda, Osamu, Yasaka, Anto
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container_issue 11
container_start_page 118002
container_title Japanese Journal of Applied Physics
container_volume 53
creator Akabori, Masashi
Hidaka, Shiro
Yamada, Syoji
Kozakai, Tomokazu
Matsuda, Osamu
Yasaka, Anto
description Quantum point contacts (QPCs) in high-In-content InGaAs modulation-doped heterostructures fabricated using a focused ion beam (FIB) system equipped with a N sub(2) gas field ion source (GFIS) are demonstrated. The minimum physical size of the fabricated QPCs in this study is ~30 nm, which is smaller than the typical physical size of QPCs (>50 nm) obtained by electron beam lithography and etching techniques. In addition, the fabricated QPCs are characterized electrically at low temperatures with magnetic fields. Since some of them show conductance quantization behaviors, the results indicate that the GFIS-FIB process is promising for quantum device fabrication.
doi_str_mv 10.7567/JJAP.53.118002
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects Conductance
Devices
Electron beam lithography
Etching
Ground fault interruptions
Ion beams
Ion sources
Magnetic fields
Point contact
title High-In-content InGaAs quantum point contacts fabricated using focused ion beam system equipped with N sub(2) gas field ion source
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