Highly Solvent-Resistant Polystyrene Based on Uniform Tetraamide Units
ABSTRACT In this article, segmented multiblock copolymers are synthesized using monodispersed tetraamide (T6T6T or T6A6T dimethyl) as hard segments and hydroxy‐terminated polystyrene (PSt) with a low molecular weight of 2500 g/mol as a soft segment. The soft segment length was varied from 2500 to 11...
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| Veröffentlicht in: | Advances in polymer technology 2015-06, Vol.34 (2), p.np-n/a |
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| container_title | Advances in polymer technology |
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| creator | Vakees, E. Suresh, J. Kayalvizhi, M. Nagarajan, S. Arun, A. |
| description | ABSTRACT
In this article, segmented multiblock copolymers are synthesized using monodispersed tetraamide (T6T6T or T6A6T dimethyl) as hard segments and hydroxy‐terminated polystyrene (PSt) with a low molecular weight of 2500 g/mol as a soft segment. The soft segment length was varied from 2500 to 11,000 g/mol using dimethylterephthalate as a chain extender. The copolymers are characterized by inherent viscosity measurements, Fourier‐transform infrared spectroscopy (FTIR), differential scanning calorimetry (DSC), thermogravimetric analysis (TGA), water absorption, and solvent resistivity. The inherent viscosity increases with increasing soft segment length. Depending on the amide concentration in the copolymers, the hard segment melting temperature ranged between 248 and 287°C. From the FTIR, DSC, and wide angle X‐ray diffraction results, it is concluded that the hard segments in the copolymer are crystallized completely. All the polymers showed single‐stage decomposition temperature centered around 430°C. The solvent resistivity of these materials is extremely very high even at a low concentration of amide content (7%). |
| doi_str_mv | 10.1002/adv.21485 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1685778322</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1685778322</sourcerecordid><originalsourceid>FETCH-LOGICAL-c3405-3352c9202bfc931dc61eefdbb100a4fa145474619b5446c6c5405130f13f5c263</originalsourceid><addsrcrecordid>eNp1kE1PwkAQQDdGExE9-A961ENhv9seQQUkRI2Aettst1Ot9gN3C9p_bxH15mmSyXuTyUPolOAewZj2dbLpUcJDsYc6BEehTxmN9lEHBwz7UgbRITpy7hVjQrhkHTSaZM8veePNq3wDZe3fg8tcrcvau6vyxtWNhRK8oXaQeFXpLcssrWzhLaC2WhdZAttV7Y7RQapzByc_s4uWo6vFxcSf3Y6vLwYz3zCOhc-YoCaimMapiRhJjCQAaRLH7e-ap5pwwQMuSRQLzqWRRrQWYTglLBWGStZFZ7u7K1u9r8HVqsicgTzXJVRrp4gMRRCEjNIWPd-hxlbOWUjVymaFto0iWG1bqbaV-m7Vsv0d-5Hl0PwPqsHlw6_h74y2Fnz-Gdq-KRmwQKjHm7GS8ynlT_OpGrIvuBl5Jw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1685778322</pqid></control><display><type>article</type><title>Highly Solvent-Resistant Polystyrene Based on Uniform Tetraamide Units</title><source>EZB-FREE-00999 freely available EZB journals</source><source>Alma/SFX Local Collection</source><creator>Vakees, E. ; Suresh, J. ; Kayalvizhi, M. ; Nagarajan, S. ; Arun, A.</creator><creatorcontrib>Vakees, E. ; Suresh, J. ; Kayalvizhi, M. ; Nagarajan, S. ; Arun, A.</creatorcontrib><description>ABSTRACT
In this article, segmented multiblock copolymers are synthesized using monodispersed tetraamide (T6T6T or T6A6T dimethyl) as hard segments and hydroxy‐terminated polystyrene (PSt) with a low molecular weight of 2500 g/mol as a soft segment. The soft segment length was varied from 2500 to 11,000 g/mol using dimethylterephthalate as a chain extender. The copolymers are characterized by inherent viscosity measurements, Fourier‐transform infrared spectroscopy (FTIR), differential scanning calorimetry (DSC), thermogravimetric analysis (TGA), water absorption, and solvent resistivity. The inherent viscosity increases with increasing soft segment length. Depending on the amide concentration in the copolymers, the hard segment melting temperature ranged between 248 and 287°C. From the FTIR, DSC, and wide angle X‐ray diffraction results, it is concluded that the hard segments in the copolymer are crystallized completely. All the polymers showed single‐stage decomposition temperature centered around 430°C. The solvent resistivity of these materials is extremely very high even at a low concentration of amide content (7%).</description><identifier>ISSN: 0730-6679</identifier><identifier>EISSN: 1098-2329</identifier><identifier>DOI: 10.1002/adv.21485</identifier><language>eng</language><publisher>Blackwell Publishing Ltd</publisher><subject>Amides ; Copolymers ; Crystallisation ; Differential scanning calorimetry ; Dimethyl ; Electrical resistivity ; Hard segments ; Infrared spectroscopy ; Polyamides ; Polystyrene ; Polystyrene resins ; Segments ; Solvents ; Water absorption</subject><ispartof>Advances in polymer technology, 2015-06, Vol.34 (2), p.np-n/a</ispartof><rights>2014 Wiley Periodicals, Inc.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3405-3352c9202bfc931dc61eefdbb100a4fa145474619b5446c6c5405130f13f5c263</citedby><cites>FETCH-LOGICAL-c3405-3352c9202bfc931dc61eefdbb100a4fa145474619b5446c6c5405130f13f5c263</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Vakees, E.</creatorcontrib><creatorcontrib>Suresh, J.</creatorcontrib><creatorcontrib>Kayalvizhi, M.</creatorcontrib><creatorcontrib>Nagarajan, S.</creatorcontrib><creatorcontrib>Arun, A.</creatorcontrib><title>Highly Solvent-Resistant Polystyrene Based on Uniform Tetraamide Units</title><title>Advances in polymer technology</title><addtitle>Adv. Polym. Technol</addtitle><description>ABSTRACT
In this article, segmented multiblock copolymers are synthesized using monodispersed tetraamide (T6T6T or T6A6T dimethyl) as hard segments and hydroxy‐terminated polystyrene (PSt) with a low molecular weight of 2500 g/mol as a soft segment. The soft segment length was varied from 2500 to 11,000 g/mol using dimethylterephthalate as a chain extender. The copolymers are characterized by inherent viscosity measurements, Fourier‐transform infrared spectroscopy (FTIR), differential scanning calorimetry (DSC), thermogravimetric analysis (TGA), water absorption, and solvent resistivity. The inherent viscosity increases with increasing soft segment length. Depending on the amide concentration in the copolymers, the hard segment melting temperature ranged between 248 and 287°C. From the FTIR, DSC, and wide angle X‐ray diffraction results, it is concluded that the hard segments in the copolymer are crystallized completely. All the polymers showed single‐stage decomposition temperature centered around 430°C. The solvent resistivity of these materials is extremely very high even at a low concentration of amide content (7%).</description><subject>Amides</subject><subject>Copolymers</subject><subject>Crystallisation</subject><subject>Differential scanning calorimetry</subject><subject>Dimethyl</subject><subject>Electrical resistivity</subject><subject>Hard segments</subject><subject>Infrared spectroscopy</subject><subject>Polyamides</subject><subject>Polystyrene</subject><subject>Polystyrene resins</subject><subject>Segments</subject><subject>Solvents</subject><subject>Water absorption</subject><issn>0730-6679</issn><issn>1098-2329</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><recordid>eNp1kE1PwkAQQDdGExE9-A961ENhv9seQQUkRI2Aettst1Ot9gN3C9p_bxH15mmSyXuTyUPolOAewZj2dbLpUcJDsYc6BEehTxmN9lEHBwz7UgbRITpy7hVjQrhkHTSaZM8veePNq3wDZe3fg8tcrcvau6vyxtWNhRK8oXaQeFXpLcssrWzhLaC2WhdZAttV7Y7RQapzByc_s4uWo6vFxcSf3Y6vLwYz3zCOhc-YoCaimMapiRhJjCQAaRLH7e-ap5pwwQMuSRQLzqWRRrQWYTglLBWGStZFZ7u7K1u9r8HVqsicgTzXJVRrp4gMRRCEjNIWPd-hxlbOWUjVymaFto0iWG1bqbaV-m7Vsv0d-5Hl0PwPqsHlw6_h74y2Fnz-Gdq-KRmwQKjHm7GS8ynlT_OpGrIvuBl5Jw</recordid><startdate>20150601</startdate><enddate>20150601</enddate><creator>Vakees, E.</creator><creator>Suresh, J.</creator><creator>Kayalvizhi, M.</creator><creator>Nagarajan, S.</creator><creator>Arun, A.</creator><general>Blackwell Publishing Ltd</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20150601</creationdate><title>Highly Solvent-Resistant Polystyrene Based on Uniform Tetraamide Units</title><author>Vakees, E. ; Suresh, J. ; Kayalvizhi, M. ; Nagarajan, S. ; Arun, A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3405-3352c9202bfc931dc61eefdbb100a4fa145474619b5446c6c5405130f13f5c263</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>Amides</topic><topic>Copolymers</topic><topic>Crystallisation</topic><topic>Differential scanning calorimetry</topic><topic>Dimethyl</topic><topic>Electrical resistivity</topic><topic>Hard segments</topic><topic>Infrared spectroscopy</topic><topic>Polyamides</topic><topic>Polystyrene</topic><topic>Polystyrene resins</topic><topic>Segments</topic><topic>Solvents</topic><topic>Water absorption</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Vakees, E.</creatorcontrib><creatorcontrib>Suresh, J.</creatorcontrib><creatorcontrib>Kayalvizhi, M.</creatorcontrib><creatorcontrib>Nagarajan, S.</creatorcontrib><creatorcontrib>Arun, A.</creatorcontrib><collection>Istex</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Advances in polymer technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Vakees, E.</au><au>Suresh, J.</au><au>Kayalvizhi, M.</au><au>Nagarajan, S.</au><au>Arun, A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Highly Solvent-Resistant Polystyrene Based on Uniform Tetraamide Units</atitle><jtitle>Advances in polymer technology</jtitle><addtitle>Adv. Polym. Technol</addtitle><date>2015-06-01</date><risdate>2015</risdate><volume>34</volume><issue>2</issue><spage>np</spage><epage>n/a</epage><pages>np-n/a</pages><issn>0730-6679</issn><eissn>1098-2329</eissn><abstract>ABSTRACT
In this article, segmented multiblock copolymers are synthesized using monodispersed tetraamide (T6T6T or T6A6T dimethyl) as hard segments and hydroxy‐terminated polystyrene (PSt) with a low molecular weight of 2500 g/mol as a soft segment. The soft segment length was varied from 2500 to 11,000 g/mol using dimethylterephthalate as a chain extender. The copolymers are characterized by inherent viscosity measurements, Fourier‐transform infrared spectroscopy (FTIR), differential scanning calorimetry (DSC), thermogravimetric analysis (TGA), water absorption, and solvent resistivity. The inherent viscosity increases with increasing soft segment length. Depending on the amide concentration in the copolymers, the hard segment melting temperature ranged between 248 and 287°C. From the FTIR, DSC, and wide angle X‐ray diffraction results, it is concluded that the hard segments in the copolymer are crystallized completely. All the polymers showed single‐stage decomposition temperature centered around 430°C. The solvent resistivity of these materials is extremely very high even at a low concentration of amide content (7%).</abstract><pub>Blackwell Publishing Ltd</pub><doi>10.1002/adv.21485</doi><tpages>9</tpages></addata></record> |
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| language | eng |
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| source | EZB-FREE-00999 freely available EZB journals; Alma/SFX Local Collection |
| subjects | Amides Copolymers Crystallisation Differential scanning calorimetry Dimethyl Electrical resistivity Hard segments Infrared spectroscopy Polyamides Polystyrene Polystyrene resins Segments Solvents Water absorption |
| title | Highly Solvent-Resistant Polystyrene Based on Uniform Tetraamide Units |
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