Enhanced hydrogen production by water splitting using Cu-doped TiO2 film with preferred (001) orientation
•Cu-doped TiO2 film with preferred (001) orientation was successfully fabricated by RF magnetron sputtering.•With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets.•The H2 production rate of Cu-doped TiO2 film is...
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Veröffentlicht in: | Applied surface science 2014-02, Vol.292, p.161-164 |
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creator | Wang, Chong Hu, Qianqian Huang, Jiquan Zhu, Chen Deng, Zhonghua Shi, Hongling Wu, Lan Liu, Zhuguang Cao, Yongge |
description | •Cu-doped TiO2 film with preferred (001) orientation was successfully fabricated by RF magnetron sputtering.•With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets.•The H2 production rate of Cu-doped TiO2 film is far higher than that of undoped TiO2 film and even about 67 times higher than that of P25 powder.
Cu-doped TiO2 film with preferred (001) orientation was deposited by RF magnetron sputtering. Experimental results show that the preferred orientation of the film can be greatly influenced by the sputtering of copper target during the deposition. With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets. The H2 production rate of Cu-doped TiO2 film is about 810μmolg−1h−1, which is far higher than that of undoped TiO2 film and even about 67 times higher than that of P25 powder. |
doi_str_mv | 10.1016/j.apsusc.2013.11.105 |
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Cu-doped TiO2 film with preferred (001) orientation was deposited by RF magnetron sputtering. Experimental results show that the preferred orientation of the film can be greatly influenced by the sputtering of copper target during the deposition. With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets. The H2 production rate of Cu-doped TiO2 film is about 810μmolg−1h−1, which is far higher than that of undoped TiO2 film and even about 67 times higher than that of P25 powder.</description><identifier>ISSN: 0169-4332</identifier><identifier>EISSN: 1873-5584</identifier><identifier>DOI: 10.1016/j.apsusc.2013.11.105</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Anatase ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Copper ; Cross-disciplinary physics: materials science; rheology ; CRYSTAL STRUCTURE ; Cu-doped TiO2 film ; DEPOSITION ; DOPING ; Exact sciences and technology ; HYDROGEN ; Hydrogen production ; Orientation ; Photocatalytic water splitting ; Physics ; PREFERRED ORIENTATION ; RF magnetron sputtering ; SPUTTERING ; TITANIUM DIOXIDE ; WATER ; Water splitting</subject><ispartof>Applied surface science, 2014-02, Vol.292, p.161-164</ispartof><rights>2013 Elsevier B.V.</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c299t-ca2d79871b6cdf2eb6a40bbebdfd0d28057b8be678f451b66404f063230eab6a3</citedby><cites>FETCH-LOGICAL-c299t-ca2d79871b6cdf2eb6a40bbebdfd0d28057b8be678f451b66404f063230eab6a3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0169433213021831$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3537,27901,27902,65306</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=28607498$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Wang, Chong</creatorcontrib><creatorcontrib>Hu, Qianqian</creatorcontrib><creatorcontrib>Huang, Jiquan</creatorcontrib><creatorcontrib>Zhu, Chen</creatorcontrib><creatorcontrib>Deng, Zhonghua</creatorcontrib><creatorcontrib>Shi, Hongling</creatorcontrib><creatorcontrib>Wu, Lan</creatorcontrib><creatorcontrib>Liu, Zhuguang</creatorcontrib><creatorcontrib>Cao, Yongge</creatorcontrib><title>Enhanced hydrogen production by water splitting using Cu-doped TiO2 film with preferred (001) orientation</title><title>Applied surface science</title><description>•Cu-doped TiO2 film with preferred (001) orientation was successfully fabricated by RF magnetron sputtering.•With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets.•The H2 production rate of Cu-doped TiO2 film is far higher than that of undoped TiO2 film and even about 67 times higher than that of P25 powder.
Cu-doped TiO2 film with preferred (001) orientation was deposited by RF magnetron sputtering. Experimental results show that the preferred orientation of the film can be greatly influenced by the sputtering of copper target during the deposition. With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets. The H2 production rate of Cu-doped TiO2 film is about 810μmolg−1h−1, which is far higher than that of undoped TiO2 film and even about 67 times higher than that of P25 powder.</description><subject>Anatase</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Copper</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>CRYSTAL STRUCTURE</subject><subject>Cu-doped TiO2 film</subject><subject>DEPOSITION</subject><subject>DOPING</subject><subject>Exact sciences and technology</subject><subject>HYDROGEN</subject><subject>Hydrogen production</subject><subject>Orientation</subject><subject>Photocatalytic water splitting</subject><subject>Physics</subject><subject>PREFERRED ORIENTATION</subject><subject>RF magnetron sputtering</subject><subject>SPUTTERING</subject><subject>TITANIUM DIOXIDE</subject><subject>WATER</subject><subject>Water splitting</subject><issn>0169-4332</issn><issn>1873-5584</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNp9kE-L2zAQxUXpQtNsv0EPuhTSg7OSbMvypVBC9g8s5JI9C1kaJwqO7UpyQ779jsnSYy8SzPzevJlHyHfO1pxx-XBamzFO0a4F4_mac6yWn8iCqyrPylIVn8kCsTor8lx8IV9jPDHGBXYXxG_7o-ktOHq8ujAcoKdjGNxkkx962lzpxSQINI6dT8n3BzrF-d1MmRtGVO39TtDWd2d68emIWmghBGys0OInHYKHPpl52D25a00X4dvHvyRvj9v95jl73T29bH6_ZlbUdcqsEa6qVcUbaV0roJGmYE0DjWsdc0KxsmpUA7JSbVEiJAtWtEzmImdgEM6XZHWbi3f8mSAmffbRQteZHoYpai5VWUk1R7UkxQ21YYgRV9dj8GcTrpozPSerT_qWrJ5xzTlWS5T9-HAw0ZquDRigj_-0QklWFbVC7teNAzz3r4ego8U4MGwfwCbtBv9_o3et_JGv</recordid><startdate>20140215</startdate><enddate>20140215</enddate><creator>Wang, Chong</creator><creator>Hu, Qianqian</creator><creator>Huang, Jiquan</creator><creator>Zhu, Chen</creator><creator>Deng, Zhonghua</creator><creator>Shi, Hongling</creator><creator>Wu, Lan</creator><creator>Liu, Zhuguang</creator><creator>Cao, Yongge</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>H8G</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20140215</creationdate><title>Enhanced hydrogen production by water splitting using Cu-doped TiO2 film with preferred (001) orientation</title><author>Wang, Chong ; Hu, Qianqian ; Huang, Jiquan ; Zhu, Chen ; Deng, Zhonghua ; Shi, Hongling ; Wu, Lan ; Liu, Zhuguang ; Cao, Yongge</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c299t-ca2d79871b6cdf2eb6a40bbebdfd0d28057b8be678f451b66404f063230eab6a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>Anatase</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Copper</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>CRYSTAL STRUCTURE</topic><topic>Cu-doped TiO2 film</topic><topic>DEPOSITION</topic><topic>DOPING</topic><topic>Exact sciences and technology</topic><topic>HYDROGEN</topic><topic>Hydrogen production</topic><topic>Orientation</topic><topic>Photocatalytic water splitting</topic><topic>Physics</topic><topic>PREFERRED ORIENTATION</topic><topic>RF magnetron sputtering</topic><topic>SPUTTERING</topic><topic>TITANIUM DIOXIDE</topic><topic>WATER</topic><topic>Water splitting</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Wang, Chong</creatorcontrib><creatorcontrib>Hu, Qianqian</creatorcontrib><creatorcontrib>Huang, Jiquan</creatorcontrib><creatorcontrib>Zhu, Chen</creatorcontrib><creatorcontrib>Deng, Zhonghua</creatorcontrib><creatorcontrib>Shi, Hongling</creatorcontrib><creatorcontrib>Wu, Lan</creatorcontrib><creatorcontrib>Liu, Zhuguang</creatorcontrib><creatorcontrib>Cao, Yongge</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Copper Technical Reference Library</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied surface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Wang, Chong</au><au>Hu, Qianqian</au><au>Huang, Jiquan</au><au>Zhu, Chen</au><au>Deng, Zhonghua</au><au>Shi, Hongling</au><au>Wu, Lan</au><au>Liu, Zhuguang</au><au>Cao, Yongge</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Enhanced hydrogen production by water splitting using Cu-doped TiO2 film with preferred (001) orientation</atitle><jtitle>Applied surface science</jtitle><date>2014-02-15</date><risdate>2014</risdate><volume>292</volume><spage>161</spage><epage>164</epage><pages>161-164</pages><issn>0169-4332</issn><eissn>1873-5584</eissn><abstract>•Cu-doped TiO2 film with preferred (001) orientation was successfully fabricated by RF magnetron sputtering.•With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets.•The H2 production rate of Cu-doped TiO2 film is far higher than that of undoped TiO2 film and even about 67 times higher than that of P25 powder.
Cu-doped TiO2 film with preferred (001) orientation was deposited by RF magnetron sputtering. Experimental results show that the preferred orientation of the film can be greatly influenced by the sputtering of copper target during the deposition. With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets. The H2 production rate of Cu-doped TiO2 film is about 810μmolg−1h−1, which is far higher than that of undoped TiO2 film and even about 67 times higher than that of P25 powder.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.apsusc.2013.11.105</doi><tpages>4</tpages></addata></record> |
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subjects | Anatase Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Copper Cross-disciplinary physics: materials science rheology CRYSTAL STRUCTURE Cu-doped TiO2 film DEPOSITION DOPING Exact sciences and technology HYDROGEN Hydrogen production Orientation Photocatalytic water splitting Physics PREFERRED ORIENTATION RF magnetron sputtering SPUTTERING TITANIUM DIOXIDE WATER Water splitting |
title | Enhanced hydrogen production by water splitting using Cu-doped TiO2 film with preferred (001) orientation |
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