Enhanced hydrogen production by water splitting using Cu-doped TiO2 film with preferred (001) orientation

•Cu-doped TiO2 film with preferred (001) orientation was successfully fabricated by RF magnetron sputtering.•With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets.•The H2 production rate of Cu-doped TiO2 film is...

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Veröffentlicht in:Applied surface science 2014-02, Vol.292, p.161-164
Hauptverfasser: Wang, Chong, Hu, Qianqian, Huang, Jiquan, Zhu, Chen, Deng, Zhonghua, Shi, Hongling, Wu, Lan, Liu, Zhuguang, Cao, Yongge
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container_end_page 164
container_issue
container_start_page 161
container_title Applied surface science
container_volume 292
creator Wang, Chong
Hu, Qianqian
Huang, Jiquan
Zhu, Chen
Deng, Zhonghua
Shi, Hongling
Wu, Lan
Liu, Zhuguang
Cao, Yongge
description •Cu-doped TiO2 film with preferred (001) orientation was successfully fabricated by RF magnetron sputtering.•With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets.•The H2 production rate of Cu-doped TiO2 film is far higher than that of undoped TiO2 film and even about 67 times higher than that of P25 powder. Cu-doped TiO2 film with preferred (001) orientation was deposited by RF magnetron sputtering. Experimental results show that the preferred orientation of the film can be greatly influenced by the sputtering of copper target during the deposition. With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets. The H2 production rate of Cu-doped TiO2 film is about 810μmolg−1h−1, which is far higher than that of undoped TiO2 film and even about 67 times higher than that of P25 powder.
doi_str_mv 10.1016/j.apsusc.2013.11.105
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Cu-doped TiO2 film with preferred (001) orientation was deposited by RF magnetron sputtering. Experimental results show that the preferred orientation of the film can be greatly influenced by the sputtering of copper target during the deposition. With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets. 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Cu-doped TiO2 film with preferred (001) orientation was deposited by RF magnetron sputtering. Experimental results show that the preferred orientation of the film can be greatly influenced by the sputtering of copper target during the deposition. With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets. 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Cu-doped TiO2 film with preferred (001) orientation was deposited by RF magnetron sputtering. Experimental results show that the preferred orientation of the film can be greatly influenced by the sputtering of copper target during the deposition. With the introduction of copper, minor rutile phase appears and the main exposed anatase facets of the film change from (101) to (001) facets. The H2 production rate of Cu-doped TiO2 film is about 810μmolg−1h−1, which is far higher than that of undoped TiO2 film and even about 67 times higher than that of P25 powder.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.apsusc.2013.11.105</doi><tpages>4</tpages></addata></record>
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subjects Anatase
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Copper
Cross-disciplinary physics: materials science
rheology
CRYSTAL STRUCTURE
Cu-doped TiO2 film
DEPOSITION
DOPING
Exact sciences and technology
HYDROGEN
Hydrogen production
Orientation
Photocatalytic water splitting
Physics
PREFERRED ORIENTATION
RF magnetron sputtering
SPUTTERING
TITANIUM DIOXIDE
WATER
Water splitting
title Enhanced hydrogen production by water splitting using Cu-doped TiO2 film with preferred (001) orientation
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