Water chemisorption on a sputter deposited uranium dioxide film — Effect of defects

The characteristics of water vapor chemisorptions on stoichiometric and on sputtered reduced UO2 thin film surfaces, obtained by the reactive sputter deposition technique, were studied by utilizing direct recoil spectrometry and X-ray photoelectron spectroscopy over a temperature range of 300–500K....

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Veröffentlicht in:	Solid state ionics 2014-10, Vol.263, p.39-45
Hauptverfasser:	Cohen, S., Mintz, M.H., Zalkind, S., Seibert, A., Gouder, T., Shamir, N.
Format:	Artikel
Sprache:	eng
Schlagworte:	Adsorption kinetics Chemisorption Chemisorption, Surface defects Clusters Defects Deposition Dissociation Fragments Hydrogen bonds Surface chemistry Surface defects UO2 Water vapor
Online-Zugang:	Volltext
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