Structural Effect of PVA Brush Nodule on Particle Removal Efficiency during Brush Scrubber Cleaning

Brush cleaning can trigger both mechanical and chemical reaction to efficiently remove the adsorbed particles on the wafer. However, the removal mechanism of nanosized particles by brush cleaning is far from clear because no direct experimental data, such as the friction and contact force of the int...

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Bibliographische Detailangaben

Veröffentlicht in:	Key engineering materials 2012-06, Vol.516, p.84-89
Hauptverfasser:	Park, Yeong Bong, An, Joon Ho, Jeong, Hae Do
Format:	Artikel
Sprache:	eng
Schlagworte:	Brushes Cleaning Friction Monitoring Nodules Scrubbers Wafers Zeta potential
Online-Zugang:	Volltext
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