Molecular dynamics simulations of clusters and thin film growth in the context of plasma sputtering deposition
Carrying out molecular dynamics (MD) simulations is a relevant way to understand growth phenomena at the atomic scale. Initial conditions are defined for reproducing deposition conditions of plasma sputtering experiments. Two case studies are developed to highlight the implementation of MD simulatio...
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Veröffentlicht in: | Journal of physics. D, Applied physics Applied physics, 2014-06, Vol.47 (22), p.1-17 |
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container_title | Journal of physics. D, Applied physics |
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creator | Xie, Lu Brault, Pascal Bauchire, Jean-Marc Thomann, Anne-Lise Bedra, Larbi |
description | Carrying out molecular dynamics (MD) simulations is a relevant way to understand growth phenomena at the atomic scale. Initial conditions are defined for reproducing deposition conditions of plasma sputtering experiments. Two case studies are developed to highlight the implementation of MD simulations in the context of plasma sputtering deposition: ZrxCu1−x metallic glass and AlCoCrCuFeNi high entropy alloy thin films deposited onto silicon. Effects of depositing atom kinetic energies and atomic composition are studied in order to predict the evolution of morphologies and atomic structure of MD grown thin films. Experimental and simulated x-ray diffraction patterns are compared. |
doi_str_mv | 10.1088/0022-3727/47/22/224004 |
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Initial conditions are defined for reproducing deposition conditions of plasma sputtering experiments. Two case studies are developed to highlight the implementation of MD simulations in the context of plasma sputtering deposition: ZrxCu1−x metallic glass and AlCoCrCuFeNi high entropy alloy thin films deposited onto silicon. Effects of depositing atom kinetic energies and atomic composition are studied in order to predict the evolution of morphologies and atomic structure of MD grown thin films. 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Experimental and simulated x-ray diffraction patterns are compared.</description><subject>Atomic structure</subject><subject>cluster growth</subject><subject>Deposition</subject><subject>Engineering Sciences</subject><subject>Entropy</subject><subject>Molecular dynamics</subject><subject>Plasma (physics)</subject><subject>plasma sputtering</subject><subject>Plasmas</subject><subject>Simulation</subject><subject>Sputtering</subject><subject>thin film growth</subject><subject>Thin films</subject><issn>0022-3727</issn><issn>1361-6463</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNqFkUFv1DAQhS0EEkvhLyAf4RB2xnHs5FhV0CIt6qWcLddxuq4cO9gO0H-Po6BeK43k8eh7byw_Qj4ifEHo-yMAY00rmTxyeWSsFgfgr8gBW4GN4KJ9TQ7P0FvyLudHAOhEjwcSfkRvzep1ouNT0LMzmWY310FxMWQaJ2r8motNmeow0nJ2gU7Oz_QhxT_lTOu1nC01MRT7t2z84nWeNc3LWqrMhQc62iVmtxm-J28m7bP98P-8ID-_fb27umlOt9ffry5PjeFclIbdD91guGFW4jRxwdkoUQo-DR2gZDgAGpikwFa2cM_5KHqGRowdTj0bB91ekM-771l7tSQ36_Skonbq5vKkthnA0HXV7DdW9tPOLin-Wm0uanbZWO91sHHNCoXsAZDVXS-inZDQSxSiomJHTYo5Jzs9PwNBbbmpLRK1RaK4VLXdc6tCtgtdXNRjXFOoH_WS6B9gw5kF</recordid><startdate>20140604</startdate><enddate>20140604</enddate><creator>Xie, Lu</creator><creator>Brault, Pascal</creator><creator>Bauchire, Jean-Marc</creator><creator>Thomann, Anne-Lise</creator><creator>Bedra, Larbi</creator><general>IOP Publishing</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SC</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>JQ2</scope><scope>L7M</scope><scope>L~C</scope><scope>L~D</scope><scope>1XC</scope><scope>VOOES</scope><orcidid>https://orcid.org/0000-0002-7226-0464</orcidid><orcidid>https://orcid.org/0000-0002-8380-480X</orcidid></search><sort><creationdate>20140604</creationdate><title>Molecular dynamics simulations of clusters and thin film growth in the context of plasma sputtering deposition</title><author>Xie, Lu ; Brault, Pascal ; Bauchire, Jean-Marc ; Thomann, Anne-Lise ; Bedra, Larbi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c446t-2b959c4c2e71ff4642d71764f9501721901c0f7613730b44d6821c6d51f82d9a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>Atomic structure</topic><topic>cluster growth</topic><topic>Deposition</topic><topic>Engineering Sciences</topic><topic>Entropy</topic><topic>Molecular dynamics</topic><topic>Plasma (physics)</topic><topic>plasma sputtering</topic><topic>Plasmas</topic><topic>Simulation</topic><topic>Sputtering</topic><topic>thin film growth</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Xie, Lu</creatorcontrib><creatorcontrib>Brault, Pascal</creatorcontrib><creatorcontrib>Bauchire, Jean-Marc</creatorcontrib><creatorcontrib>Thomann, Anne-Lise</creatorcontrib><creatorcontrib>Bedra, Larbi</creatorcontrib><collection>CrossRef</collection><collection>Computer and Information Systems Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Computer and Information Systems Abstracts Academic</collection><collection>Computer and Information Systems Abstracts Professional</collection><collection>Hyper Article en Ligne (HAL)</collection><collection>Hyper Article en Ligne (HAL) (Open Access)</collection><jtitle>Journal of physics. 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subjects | Atomic structure cluster growth Deposition Engineering Sciences Entropy Molecular dynamics Plasma (physics) plasma sputtering Plasmas Simulation Sputtering thin film growth Thin films |
title | Molecular dynamics simulations of clusters and thin film growth in the context of plasma sputtering deposition |
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