Fabrication of Si Mold Using ICP Etching for X-Ray Diffraction Grating

We have fabricated X-ray diffraction gratings for X-ray phase imaging using X-ray Talbot interferometer. In this paper, we propose the new low cost fabrication process using Si mold of Si dry etching and nano-imprint techniques. Si dry etching makes it possible to fabricate high aspect ratio rectang...

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Veröffentlicht in:	Key engineering materials 2012-11, Vol.523-524, p.587-591
Hauptverfasser:	Tokuoka, Atsushi, Hattori, Tadashi, Noda, Daiji
Format:	Artikel
Sprache:	eng
Schlagworte:	Diffraction gratings Drying Etching Low cost Molds Nanostructure Silicon X-rays
Online-Zugang:	Volltext
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