Fabrication of Si Mold Using ICP Etching for X-Ray Diffraction Grating
We have fabricated X-ray diffraction gratings for X-ray phase imaging using X-ray Talbot interferometer. In this paper, we propose the new low cost fabrication process using Si mold of Si dry etching and nano-imprint techniques. Si dry etching makes it possible to fabricate high aspect ratio rectang...
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| Veröffentlicht in: | Key engineering materials 2012-11, Vol.523-524, p.587-591 |
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| creator | Tokuoka, Atsushi Hattori, Tadashi Noda, Daiji |
| description | We have fabricated X-ray diffraction gratings for X-ray phase imaging using X-ray Talbot interferometer. In this paper, we propose the new low cost fabrication process using Si mold of Si dry etching and nano-imprint techniques. Si dry etching makes it possible to fabricate high aspect ratio rectangular microstructures. Therefore, this technique is expected to fabricate high precision grating pattern. In this paper, we propose the new low cost fabrication processes using Si mold of ICP-RIE and nano-imprint techniques. And, in order to form transparence imprint mold, we used thermal oxidation of Si mold. These demonstrations of thermal oxidation are promising method for high precision transparence imprint mold with low cost, and realized low cost optical device such as diffraction gratings. |
| doi_str_mv | 10.4028/www.scientific.net/KEM.523-524.587 |
| format | Article |
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In this paper, we propose the new low cost fabrication process using Si mold of Si dry etching and nano-imprint techniques. Si dry etching makes it possible to fabricate high aspect ratio rectangular microstructures. Therefore, this technique is expected to fabricate high precision grating pattern. In this paper, we propose the new low cost fabrication processes using Si mold of ICP-RIE and nano-imprint techniques. And, in order to form transparence imprint mold, we used thermal oxidation of Si mold. These demonstrations of thermal oxidation are promising method for high precision transparence imprint mold with low cost, and realized low cost optical device such as diffraction gratings.</description><subject>Diffraction gratings</subject><subject>Drying</subject><subject>Etching</subject><subject>Low cost</subject><subject>Molds</subject><subject>Nanostructure</subject><subject>Silicon</subject><subject>X-rays</subject><issn>1013-9826</issn><issn>1662-9795</issn><issn>1662-9795</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNqVkEtLAzEUhQdRsFb_Q5YizDSPmUlmqX1ZbFHUgruQySRtSpupSUrpvze1gltdXO5ZnHO490uSOwSzHGLW2-_3mZdG2WC0kZlVofc0nGUFJmmB86xg9CzpoLLEaUWr4jxqiEhaMVxeJlferyAkiKGik4xGonZGimBaC1oN3gyYtesGzL2xCzDpv4BhkMuj1q0DH-mrOICB0doJ-R0Zuxi1i-vkQou1Vzc_u5vMR8P3_mM6fR5P-vfTVOYUh1RBRRqKdcFYPLWuMRWQIY0xk0JqJiUUmuY5qUtBG0JJDSVuVFUUpFEUViXpJren3q1rP3fKB74xXqr1WljV7jxHJaVVRRmCf7BiiCDGOI_Wh5NVutZ7pzTfOrMR7sAR5EfePPLmv7x55M0jbx6fiJPzyDuWDE4lwQnrg5JLvmp3zkYc_6n5Akk3kaA</recordid><startdate>20121101</startdate><enddate>20121101</enddate><creator>Tokuoka, Atsushi</creator><creator>Hattori, Tadashi</creator><creator>Noda, Daiji</creator><general>Trans Tech Publications Ltd</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20121101</creationdate><title>Fabrication of Si Mold Using ICP Etching for X-Ray Diffraction Grating</title><author>Tokuoka, Atsushi ; Hattori, Tadashi ; Noda, Daiji</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c472t-e0e3d72f588523bb27a081f228cacf8cc0af7443b6a7d373b0c2de9553de70963</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Diffraction gratings</topic><topic>Drying</topic><topic>Etching</topic><topic>Low cost</topic><topic>Molds</topic><topic>Nanostructure</topic><topic>Silicon</topic><topic>X-rays</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tokuoka, Atsushi</creatorcontrib><creatorcontrib>Hattori, Tadashi</creatorcontrib><creatorcontrib>Noda, Daiji</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Key engineering materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Tokuoka, Atsushi</au><au>Hattori, Tadashi</au><au>Noda, Daiji</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fabrication of Si Mold Using ICP Etching for X-Ray Diffraction Grating</atitle><jtitle>Key engineering materials</jtitle><date>2012-11-01</date><risdate>2012</risdate><volume>523-524</volume><spage>587</spage><epage>591</epage><pages>587-591</pages><issn>1013-9826</issn><issn>1662-9795</issn><eissn>1662-9795</eissn><abstract>We have fabricated X-ray diffraction gratings for X-ray phase imaging using X-ray Talbot interferometer. In this paper, we propose the new low cost fabrication process using Si mold of Si dry etching and nano-imprint techniques. Si dry etching makes it possible to fabricate high aspect ratio rectangular microstructures. Therefore, this technique is expected to fabricate high precision grating pattern. In this paper, we propose the new low cost fabrication processes using Si mold of ICP-RIE and nano-imprint techniques. And, in order to form transparence imprint mold, we used thermal oxidation of Si mold. These demonstrations of thermal oxidation are promising method for high precision transparence imprint mold with low cost, and realized low cost optical device such as diffraction gratings.</abstract><pub>Trans Tech Publications Ltd</pub><doi>10.4028/www.scientific.net/KEM.523-524.587</doi><tpages>5</tpages></addata></record> |
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| ispartof | Key engineering materials, 2012-11, Vol.523-524, p.587-591 |
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| subjects | Diffraction gratings Drying Etching Low cost Molds Nanostructure Silicon X-rays |
| title | Fabrication of Si Mold Using ICP Etching for X-Ray Diffraction Grating |
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