In situ crystallization of sputter-deposited TiNi by ion irradiation

► We developed a sputtering deposition process equipped with an ion irradiation system. ► Ion irradiation enables crystallization at lower substrate temperature. ► Ion fluence has an effective range for low-temperature crystallization. ► Crystallized films made on polyimide by the process show the s...

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Veröffentlicht in:	Journal of alloys and compounds 2013-11, Vol.577, p.S237-S240
Hauptverfasser:	Ikenaga, Noriaki, Kishi, Yoichi, Yajima, Zenjiro, Sakudo, Noriyuki
Format:	Artikel
Sprache:	eng
Schlagworte:	Crystal structure Crystallization Intermetallics Ion fluence Low temperature crystallization Nickel base alloys Nickel compounds Nickel titanides PBII Shape memory alloys TiNi thin film Titanium compounds
Online-Zugang:	Volltext
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