Resistless nanofabrication by stencil lithography: A review

We present a review on stencil lithography and focus on the particular interest and challenges when applying it to the scalable fabrication of nm-size devices. We first describe the basic technique with its main advantages and challenges. Then we review the key results of stencil lithography in nano...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Microelectronic engineering 2015-01, Vol.132, p.236-254
Hauptverfasser:	Vazquez-Mena, O., Gross, L., Xie, S., Villanueva, L.G., Brugger, J.
Format:	Artikel
Sprache:	eng
Schlagworte:	Blurring Deposition Devices Etching Lithography Nanostructure Patterning Plasmonics
Online-Zugang:	Volltext
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