High-Breakdown-Voltage and Low-Specific-on-Resistance GaN p--n Junction Diodes on Free-Standing GaN Substrates Fabricated Through Low-Damage Field-Plate Process

In this letter, we describe the characteristics of Gallium Nitride (GaN) p--n junction diodes fabricated on free-standing GaN substrates with low specific on-resistance $R_{\text{on}}$ and high breakdown voltage $V_{\text{B}}$. The breakdown voltage of the diodes with the field-plate (FP) structure...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Japanese Journal of Applied Physics 2013-02, Vol.52 (2), p.028007-028007-3
Hauptverfasser: Hatakeyama, Yoshitomo, Nomoto, Kazuki, Terano, Akihisa, Kaneda, Naoki, Tsuchiya, Tadayoshi, Mishima, Tomoyoshi, Nakamura, Tohru
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!