Light induced crystallization of an amorphous silicon film embedded between silicon oxide layers
An amorphous Si (a‐Si) film, 60 nm thick, embedded between SiO2 layers and deposited on quartz substrate was crystallized in the regime of light‐induced solid‐phase crystallization (LISPC). The high quality of the film after LISPC was proved by high‐resolution transmission electron microscopy (HRTEM...
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Veröffentlicht in: | Physica Status Solidi. B: Basic Solid State Physics 2014-02, Vol.251 (2), p.439-445 |
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creator | Schade, Martin Mchedlidze, Teimuraz Kittler, Martin Leipner, Hartmut S. |
description | An amorphous Si (a‐Si) film, 60 nm thick, embedded between SiO2 layers and deposited on quartz substrate was crystallized in the regime of light‐induced solid‐phase crystallization (LISPC). The high quality of the film after LISPC was proved by high‐resolution transmission electron microscopy (HRTEM), by Raman spectroscopy (RS) measurements, and by electron energy loss spectroscopy (EELS). The crystallized film consisted of fully crystalline grains with lateral sizes of 200–600 nm. Only a few stacking faults and/or dislocations were detected inside these grains. Besides the large grains, regions with fully crystalline material containing a higher density of lattice defects were also observed. An intermixing of phases, i.e., SiO2 or a‐Si clusters inside the crystallized Si film and/or Si‐clysters inside the SiO2 layers, was not detected. |
doi_str_mv | 10.1002/pssb.201349143 |
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The high quality of the film after LISPC was proved by high‐resolution transmission electron microscopy (HRTEM), by Raman spectroscopy (RS) measurements, and by electron energy loss spectroscopy (EELS). The crystallized film consisted of fully crystalline grains with lateral sizes of 200–600 nm. Only a few stacking faults and/or dislocations were detected inside these grains. Besides the large grains, regions with fully crystalline material containing a higher density of lattice defects were also observed. An intermixing of phases, i.e., SiO2 or a‐Si clusters inside the crystallized Si film and/or Si‐clysters inside the SiO2 layers, was not detected.</description><identifier>ISSN: 0370-1972</identifier><identifier>EISSN: 1521-3951</identifier><identifier>DOI: 10.1002/pssb.201349143</identifier><language>eng</language><publisher>Blackwell Publishing Ltd</publisher><subject>Amorphous silicon ; Crystal structure ; Crystallization ; Density ; Dislocations ; EELS ; Electron energy loss spectroscopy ; Grains ; HRTEM ; light-induced crystallization ; Raman spectroscopy ; silicon ; Silicon dioxide ; thin films</subject><ispartof>Physica Status Solidi. B: Basic Solid State Physics, 2014-02, Vol.251 (2), p.439-445</ispartof><rights>2014 WILEY-VCH Verlag GmbH & Co. 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An intermixing of phases, i.e., SiO2 or a‐Si clusters inside the crystallized Si film and/or Si‐clysters inside the SiO2 layers, was not detected.</description><subject>Amorphous silicon</subject><subject>Crystal structure</subject><subject>Crystallization</subject><subject>Density</subject><subject>Dislocations</subject><subject>EELS</subject><subject>Electron energy loss spectroscopy</subject><subject>Grains</subject><subject>HRTEM</subject><subject>light-induced crystallization</subject><subject>Raman spectroscopy</subject><subject>silicon</subject><subject>Silicon dioxide</subject><subject>thin films</subject><issn>0370-1972</issn><issn>1521-3951</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNo9kDtPwzAUhS0EEqWwMmdkSfEjiZMRChSqClALgs049jU1OA_iVG349aQq6nRf57s6OgidEzwiGNPL2vt8RDFhUUYidoAGJKYkZFlMDtEAM45DknF6jE68_8IYc8LIAH3M7OeyDWypVwp0oJrOt9I5-ytbW5VBZQJZBrKomnpZrXzgrbOq3xvrigCKHLTuqRzaNUC5v1YbqyFwsoPGn6IjI52Hs_86RK93ty_j-3D2NHkYX81C1ftlIQMmDQccpzTBONIJlgpznCiTRzHXWhmqsyzTRsUGVJrnad_kFCKVGal1yoboYve3bqqfFfhWFNYrcE6W0DsXJOEkTlNO416a7aRr66ATdWML2XSCYLHNUWxzFPscxfNicb2fejbcsda3sNmzsvkWCWc8Fm-PEzGfT28If6diyv4AAwt7lw</recordid><startdate>201402</startdate><enddate>201402</enddate><creator>Schade, Martin</creator><creator>Mchedlidze, Teimuraz</creator><creator>Kittler, Martin</creator><creator>Leipner, Hartmut S.</creator><general>Blackwell Publishing Ltd</general><scope>BSCLL</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>201402</creationdate><title>Light induced crystallization of an amorphous silicon film embedded between silicon oxide layers</title><author>Schade, Martin ; Mchedlidze, Teimuraz ; Kittler, Martin ; Leipner, Hartmut S.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3493-3e3af7e05826004d60ac0706cfb457ddcf2d999dfc5fec8bb8c5fb2e4c9fadd83</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>Amorphous silicon</topic><topic>Crystal structure</topic><topic>Crystallization</topic><topic>Density</topic><topic>Dislocations</topic><topic>EELS</topic><topic>Electron energy loss spectroscopy</topic><topic>Grains</topic><topic>HRTEM</topic><topic>light-induced crystallization</topic><topic>Raman spectroscopy</topic><topic>silicon</topic><topic>Silicon dioxide</topic><topic>thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Schade, Martin</creatorcontrib><creatorcontrib>Mchedlidze, Teimuraz</creatorcontrib><creatorcontrib>Kittler, Martin</creatorcontrib><creatorcontrib>Leipner, Hartmut S.</creatorcontrib><collection>Istex</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Physica Status Solidi. B: Basic Solid State Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Schade, Martin</au><au>Mchedlidze, Teimuraz</au><au>Kittler, Martin</au><au>Leipner, Hartmut S.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Light induced crystallization of an amorphous silicon film embedded between silicon oxide layers</atitle><jtitle>Physica Status Solidi. B: Basic Solid State Physics</jtitle><addtitle>Phys. Status Solidi B</addtitle><date>2014-02</date><risdate>2014</risdate><volume>251</volume><issue>2</issue><spage>439</spage><epage>445</epage><pages>439-445</pages><issn>0370-1972</issn><eissn>1521-3951</eissn><abstract>An amorphous Si (a‐Si) film, 60 nm thick, embedded between SiO2 layers and deposited on quartz substrate was crystallized in the regime of light‐induced solid‐phase crystallization (LISPC). The high quality of the film after LISPC was proved by high‐resolution transmission electron microscopy (HRTEM), by Raman spectroscopy (RS) measurements, and by electron energy loss spectroscopy (EELS). The crystallized film consisted of fully crystalline grains with lateral sizes of 200–600 nm. Only a few stacking faults and/or dislocations were detected inside these grains. Besides the large grains, regions with fully crystalline material containing a higher density of lattice defects were also observed. An intermixing of phases, i.e., SiO2 or a‐Si clusters inside the crystallized Si film and/or Si‐clysters inside the SiO2 layers, was not detected.</abstract><pub>Blackwell Publishing Ltd</pub><doi>10.1002/pssb.201349143</doi><tpages>7</tpages></addata></record> |
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subjects | Amorphous silicon Crystal structure Crystallization Density Dislocations EELS Electron energy loss spectroscopy Grains HRTEM light-induced crystallization Raman spectroscopy silicon Silicon dioxide thin films |
title | Light induced crystallization of an amorphous silicon film embedded between silicon oxide layers |
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