Studies of degradation behaviors of poly (3-hexylthiophene) layers by X-ray photoelectron spectroscopy

Degradation behaviors of poly(3‐hexylthiophene‐2,5‐diyl) (P3HT) layers on NiO in the presence of H2O at ambient pressure and dark conditions were studied using X‐ray photoelectron spectroscopy (XPS). Upon H2O exposure at 120 °C, partial oxidation of P3HT together with molecular water incorporation,...

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Veröffentlicht in:	Surface and interface analysis 2014-08, Vol.46 (8), p.544-549
Hauptverfasser:	Seo, Hyun Ook, Jeong, Myung-Geun, Kim, Kwang-Dae, Kim, Dae Han, Kim, Young Dok, Lim, Dong Chan
Format:	Artikel
Sprache:	eng
Schlagworte:	Degradation H2O exposure Interface analysis Molecular structure O2 exposure Oxidation P3HT Photoelectron spectroscopy Spectra Spectrum analysis UPS X-ray photoelectron spectroscopy X-rays XPS
Online-Zugang:	Volltext
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