Downscaling ferroelectric field effect transistors by using ferroelectric Si-doped HfO2
•Doped HfO2 exhibits ferroelectricity.•Ferrolectric HfO2 was integrated in 500 nm and 100 nm FETs.•Ferroelectricity induces a VT shift enabling non-volatile data storage.•Endurance is 20k cycles and retention can be extrapolated to 10 years. Throughout the 22nm technology node HfO2 is established as...
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Veröffentlicht in: | Solid-state electronics 2013-10, Vol.88, p.65-68 |
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creator | Martin, Dominik Yurchuk, Ekaterina Müller, Stefan Müller, Johannes Paul, Jan Sundquist, Jonas Slesazeck, Stefan Schlösser, Till van Bentum, Ralf Trentzsch, Martin Schröder, Uwe Mikolajick, Thomas |
description | •Doped HfO2 exhibits ferroelectricity.•Ferrolectric HfO2 was integrated in 500 nm and 100 nm FETs.•Ferroelectricity induces a VT shift enabling non-volatile data storage.•Endurance is 20k cycles and retention can be extrapolated to 10 years.
Throughout the 22nm technology node HfO2 is established as a reliable gate dielectric in contemporary complementary metal oxide semiconductor (CMOS) technology. The working principle of ferroelectric field effect transistors FeFET has also been demonstrated for some time for dielectric materials like Pb[ZrxTi1−x]O3 and SrBi2Ta2O9. However, integrating these into contemporary downscaled CMOS technology nodes is not trivial due to the necessity of an extremely thick gate stack. Recent developments have shown HfO2 to have ferroelectric properties, given the proper doping. Moreover, these doped HfO2 thin films only require layer thicknesses similar to the ones already in use in CMOS technology. This work will show how the incorporation of Si induces ferroelectricity in HfO2 based capacitor structures and finally demonstrate non-volatile storage in nFeFETs down to a gate length of 100nm. A memory window of 0.41V can be retained after 20,000 switching cycles. Retention can be extrapolated to 10years. |
doi_str_mv | 10.1016/j.sse.2013.04.013 |
format | Article |
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Throughout the 22nm technology node HfO2 is established as a reliable gate dielectric in contemporary complementary metal oxide semiconductor (CMOS) technology. The working principle of ferroelectric field effect transistors FeFET has also been demonstrated for some time for dielectric materials like Pb[ZrxTi1−x]O3 and SrBi2Ta2O9. However, integrating these into contemporary downscaled CMOS technology nodes is not trivial due to the necessity of an extremely thick gate stack. Recent developments have shown HfO2 to have ferroelectric properties, given the proper doping. Moreover, these doped HfO2 thin films only require layer thicknesses similar to the ones already in use in CMOS technology. This work will show how the incorporation of Si induces ferroelectricity in HfO2 based capacitor structures and finally demonstrate non-volatile storage in nFeFETs down to a gate length of 100nm. A memory window of 0.41V can be retained after 20,000 switching cycles. Retention can be extrapolated to 10years.</description><identifier>ISSN: 0038-1101</identifier><identifier>EISSN: 1879-2405</identifier><identifier>DOI: 10.1016/j.sse.2013.04.013</identifier><language>eng</language><publisher>Elsevier Ltd</publisher><subject>CMOS ; Dielectrics ; FeFET ; Ferroelectric materials ; Ferroelectricity ; Field effect transistors ; Gates ; Hafnium oxide ; HfO2 ; Non-volatile memory ; Scalability ; Semiconductor devices</subject><ispartof>Solid-state electronics, 2013-10, Vol.88, p.65-68</ispartof><rights>2013 Elsevier Ltd</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c396t-d5fb47ec87c9a3d3ad093944bb329877a94f3b26a0c2928f2cb1d3718f6ea0b63</citedby><cites>FETCH-LOGICAL-c396t-d5fb47ec87c9a3d3ad093944bb329877a94f3b26a0c2928f2cb1d3718f6ea0b63</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.sse.2013.04.013$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids></links><search><creatorcontrib>Martin, Dominik</creatorcontrib><creatorcontrib>Yurchuk, Ekaterina</creatorcontrib><creatorcontrib>Müller, Stefan</creatorcontrib><creatorcontrib>Müller, Johannes</creatorcontrib><creatorcontrib>Paul, Jan</creatorcontrib><creatorcontrib>Sundquist, Jonas</creatorcontrib><creatorcontrib>Slesazeck, Stefan</creatorcontrib><creatorcontrib>Schlösser, Till</creatorcontrib><creatorcontrib>van Bentum, Ralf</creatorcontrib><creatorcontrib>Trentzsch, Martin</creatorcontrib><creatorcontrib>Schröder, Uwe</creatorcontrib><creatorcontrib>Mikolajick, Thomas</creatorcontrib><title>Downscaling ferroelectric field effect transistors by using ferroelectric Si-doped HfO2</title><title>Solid-state electronics</title><description>•Doped HfO2 exhibits ferroelectricity.•Ferrolectric HfO2 was integrated in 500 nm and 100 nm FETs.•Ferroelectricity induces a VT shift enabling non-volatile data storage.•Endurance is 20k cycles and retention can be extrapolated to 10 years.
Throughout the 22nm technology node HfO2 is established as a reliable gate dielectric in contemporary complementary metal oxide semiconductor (CMOS) technology. The working principle of ferroelectric field effect transistors FeFET has also been demonstrated for some time for dielectric materials like Pb[ZrxTi1−x]O3 and SrBi2Ta2O9. However, integrating these into contemporary downscaled CMOS technology nodes is not trivial due to the necessity of an extremely thick gate stack. Recent developments have shown HfO2 to have ferroelectric properties, given the proper doping. Moreover, these doped HfO2 thin films only require layer thicknesses similar to the ones already in use in CMOS technology. This work will show how the incorporation of Si induces ferroelectricity in HfO2 based capacitor structures and finally demonstrate non-volatile storage in nFeFETs down to a gate length of 100nm. A memory window of 0.41V can be retained after 20,000 switching cycles. Retention can be extrapolated to 10years.</description><subject>CMOS</subject><subject>Dielectrics</subject><subject>FeFET</subject><subject>Ferroelectric materials</subject><subject>Ferroelectricity</subject><subject>Field effect transistors</subject><subject>Gates</subject><subject>Hafnium oxide</subject><subject>HfO2</subject><subject>Non-volatile memory</subject><subject>Scalability</subject><subject>Semiconductor devices</subject><issn>0038-1101</issn><issn>1879-2405</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNp9kEtLAzEUhYMoWB8_wN0s3cx4k0wzE1xJfVQodKHiMmSSG0mZTmoyVfrvTak7wdXhwvddOIeQKwoVBSpuVlVKWDGgvIK6ynFEJrRtZMlqmB6TCQBvS5rRU3KW0goAmKAwIe_34XtIRvd--CgcxhiwRzNGbwrnsbcFOpfvYox6SD6NIaai2xXb9Jd_8aUNG7TF3C3ZBTlxuk94-Zvn5O3x4XU2LxfLp-fZ3aI0XIqxtFPX1Q2atjFSc8u1BcllXXcdZ7JtGi1rxzsmNBgmWeuY6ajlDW2dQA2d4Ofk-vB3E8PnFtOo1j4Z7Hs9YNgmRUVDp6KVnGeUHlATQ0oRndpEv9Zxpyio_YhqpfKIaj-iglrlyM7twcHc4ctjVMl4HAxaH3NtZYP_x_4BL097AA</recordid><startdate>20131001</startdate><enddate>20131001</enddate><creator>Martin, Dominik</creator><creator>Yurchuk, Ekaterina</creator><creator>Müller, Stefan</creator><creator>Müller, Johannes</creator><creator>Paul, Jan</creator><creator>Sundquist, Jonas</creator><creator>Slesazeck, Stefan</creator><creator>Schlösser, Till</creator><creator>van Bentum, Ralf</creator><creator>Trentzsch, Martin</creator><creator>Schröder, Uwe</creator><creator>Mikolajick, Thomas</creator><general>Elsevier Ltd</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20131001</creationdate><title>Downscaling ferroelectric field effect transistors by using ferroelectric Si-doped HfO2</title><author>Martin, Dominik ; Yurchuk, Ekaterina ; Müller, Stefan ; Müller, Johannes ; Paul, Jan ; Sundquist, Jonas ; Slesazeck, Stefan ; Schlösser, Till ; van Bentum, Ralf ; Trentzsch, Martin ; Schröder, Uwe ; Mikolajick, Thomas</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c396t-d5fb47ec87c9a3d3ad093944bb329877a94f3b26a0c2928f2cb1d3718f6ea0b63</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>CMOS</topic><topic>Dielectrics</topic><topic>FeFET</topic><topic>Ferroelectric materials</topic><topic>Ferroelectricity</topic><topic>Field effect transistors</topic><topic>Gates</topic><topic>Hafnium oxide</topic><topic>HfO2</topic><topic>Non-volatile memory</topic><topic>Scalability</topic><topic>Semiconductor devices</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Martin, Dominik</creatorcontrib><creatorcontrib>Yurchuk, Ekaterina</creatorcontrib><creatorcontrib>Müller, Stefan</creatorcontrib><creatorcontrib>Müller, Johannes</creatorcontrib><creatorcontrib>Paul, Jan</creatorcontrib><creatorcontrib>Sundquist, Jonas</creatorcontrib><creatorcontrib>Slesazeck, Stefan</creatorcontrib><creatorcontrib>Schlösser, Till</creatorcontrib><creatorcontrib>van Bentum, Ralf</creatorcontrib><creatorcontrib>Trentzsch, Martin</creatorcontrib><creatorcontrib>Schröder, Uwe</creatorcontrib><creatorcontrib>Mikolajick, Thomas</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Solid-state electronics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Martin, Dominik</au><au>Yurchuk, Ekaterina</au><au>Müller, Stefan</au><au>Müller, Johannes</au><au>Paul, Jan</au><au>Sundquist, Jonas</au><au>Slesazeck, Stefan</au><au>Schlösser, Till</au><au>van Bentum, Ralf</au><au>Trentzsch, Martin</au><au>Schröder, Uwe</au><au>Mikolajick, Thomas</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Downscaling ferroelectric field effect transistors by using ferroelectric Si-doped HfO2</atitle><jtitle>Solid-state electronics</jtitle><date>2013-10-01</date><risdate>2013</risdate><volume>88</volume><spage>65</spage><epage>68</epage><pages>65-68</pages><issn>0038-1101</issn><eissn>1879-2405</eissn><abstract>•Doped HfO2 exhibits ferroelectricity.•Ferrolectric HfO2 was integrated in 500 nm and 100 nm FETs.•Ferroelectricity induces a VT shift enabling non-volatile data storage.•Endurance is 20k cycles and retention can be extrapolated to 10 years.
Throughout the 22nm technology node HfO2 is established as a reliable gate dielectric in contemporary complementary metal oxide semiconductor (CMOS) technology. The working principle of ferroelectric field effect transistors FeFET has also been demonstrated for some time for dielectric materials like Pb[ZrxTi1−x]O3 and SrBi2Ta2O9. However, integrating these into contemporary downscaled CMOS technology nodes is not trivial due to the necessity of an extremely thick gate stack. Recent developments have shown HfO2 to have ferroelectric properties, given the proper doping. Moreover, these doped HfO2 thin films only require layer thicknesses similar to the ones already in use in CMOS technology. This work will show how the incorporation of Si induces ferroelectricity in HfO2 based capacitor structures and finally demonstrate non-volatile storage in nFeFETs down to a gate length of 100nm. A memory window of 0.41V can be retained after 20,000 switching cycles. Retention can be extrapolated to 10years.</abstract><pub>Elsevier Ltd</pub><doi>10.1016/j.sse.2013.04.013</doi><tpages>4</tpages></addata></record> |
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subjects | CMOS Dielectrics FeFET Ferroelectric materials Ferroelectricity Field effect transistors Gates Hafnium oxide HfO2 Non-volatile memory Scalability Semiconductor devices |
title | Downscaling ferroelectric field effect transistors by using ferroelectric Si-doped HfO2 |
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