Synthesis of nanocrystalline In2O3 on different Si substrates at wet oxidation environment

Polycrystalline cubic indium oxide (In2O3) thin films were successfully grown without catalyst on the different orientation of Si substrates. In2O3 thin films have been synthesized by thermal evaporation of indium on unheated Si substrates, followed by wet oxidation process. The structural and optic...

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Veröffentlicht in:Optik (Stuttgart) 2013-09, Vol.124 (17), p.2679-2681
Hauptverfasser: Amirhoseiny, Maryam, Hassan, Zainuriah, ShaShiong, Ng
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description Polycrystalline cubic indium oxide (In2O3) thin films were successfully grown without catalyst on the different orientation of Si substrates. In2O3 thin films have been synthesized by thermal evaporation of indium on unheated Si substrates, followed by wet oxidation process. The structural and optical properties of the In2O3 films were studied in terms of different substrates orientation. Through the Scherrer structural analysis revealed nanocrystalline structure for In2O3 films grown on Si (110), Si (100) and Si (111) orientations with crystallite size of 2.53, 3.36 and 3.43nm, respectively. Photoluminescence spectra showed a strong and broad emission at 570nm with two shoulders at 547nm and 604nm which related to oxygen vacancies. The band gap of polycrystalline In2O3 is determined as 2.15±0.15eV.
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subjects In2O3 nanocrystal
Indium
Indium oxides
Nanocrystals
Orientation
Photoluminescence
Si substrates
Silicon
Silicon substrates
Thin films
Wet oxidation
title Synthesis of nanocrystalline In2O3 on different Si substrates at wet oxidation environment
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