KrF pulsed laser deposition of chromium oxide thin films from Cr8O21 targets
Chromium oxides, CrxOy, are of great interest due to the wide variety of their technological applications. Among them, CrO2 has been extensively investigated in recent years because it is an attractive compound for use in spintronic heterostructures. However, its synthesis at low temperatures has be...
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| Veröffentlicht in: | Applied physics. A, Materials science & processing Materials science & processing, 2004-09, Vol.79 (4-6), p.1409-1411 |
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| container_title | Applied physics. A, Materials science & processing |
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| creator | POPOVICI, N PARAMES, M. L DA SILVA, R. C MONNEREAU, O SOUSA, P. M SILVESTRE, A. J CONDE, O |
| description | Chromium oxides, CrxOy, are of great interest due to the wide variety of their technological applications. Among them, CrO2 has been extensively investigated in recent years because it is an attractive compound for use in spintronic heterostructures. However, its synthesis at low temperatures has been a difficult task due to the metastable nature of this oxide. This is indeed essential to ensure interface quality and the ability to coat thermal-sensitive materials such as those envisaged in spintronic devices. Pulsed Laser Deposition (PLD) is a technique that has the potential to meet the requirements stated above. In this work, we describe our efforts to grow chromium oxide thin films by PLD from Cr8O21 targets, using a KrF excimer laser. The as-deposited films were investigated by X-ray diffraction and Rutherford backscattering spectrometry. Structural and chemical composition studies showed that the films consist of a mixture of amorphous chromium oxides exhibiting different stoichiometries depending on the processing parameters, where nanocrystals of mainly Cr2O3 are dispersed. The analyses do not exclude the possibility of co-deposition of Cr2O3 and a low fraction of CrO2. |
| doi_str_mv | 10.1007/s00339-004-2795-7 |
| format | Article |
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The as-deposited films were investigated by X-ray diffraction and Rutherford backscattering spectrometry. Structural and chemical composition studies showed that the films consist of a mixture of amorphous chromium oxides exhibiting different stoichiometries depending on the processing parameters, where nanocrystals of mainly Cr2O3 are dispersed. 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In this work, we describe our efforts to grow chromium oxide thin films by PLD from Cr8O21 targets, using a KrF excimer laser. The as-deposited films were investigated by X-ray diffraction and Rutherford backscattering spectrometry. Structural and chemical composition studies showed that the films consist of a mixture of amorphous chromium oxides exhibiting different stoichiometries depending on the processing parameters, where nanocrystals of mainly Cr2O3 are dispersed. 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Pulsed Laser Deposition (PLD) is a technique that has the potential to meet the requirements stated above. In this work, we describe our efforts to grow chromium oxide thin films by PLD from Cr8O21 targets, using a KrF excimer laser. The as-deposited films were investigated by X-ray diffraction and Rutherford backscattering spectrometry. Structural and chemical composition studies showed that the films consist of a mixture of amorphous chromium oxides exhibiting different stoichiometries depending on the processing parameters, where nanocrystals of mainly Cr2O3 are dispersed. The analyses do not exclude the possibility of co-deposition of Cr2O3 and a low fraction of CrO2.</abstract><cop>Berlin</cop><pub>Springer</pub><doi>10.1007/s00339-004-2795-7</doi><tpages>3</tpages></addata></record> |
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| subjects | Chromium oxides Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Devices Exact sciences and technology Excimer lasers Laser deposition Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Process parameters Pulsed laser deposition Spintronics Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology Thin films |
| title | KrF pulsed laser deposition of chromium oxide thin films from Cr8O21 targets |
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