Monolithic fringe-field-activated crystalline silicon tilting-mirror devices

A new approach is presented for fabricating monolithic crystalline silicon tilting-mirror microoptoelectromechanical systems (MOEMS) devices. The activation electrodes, etched from a thick silicon layer deposited over insulating oxide onto the top surface of a silicon-on-insulator (SOI) wafer, are d...

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Veröffentlicht in:	Journal of microelectromechanical systems 2003-10, Vol.12 (5), p.702-707
Hauptverfasser:	Greywall, D.S., Chien-Shing Pai, Sang-Hyun Oh, Chorng-Ping Chang, Marom, D.M., Busch, P.A., Cirelli, R.A., Taylor, J.A., Klemens, F.P., Sorsch, T.W., Bower, J.E., Lai, W.Y.-C., Soh, H.T.
Format:	Artikel
Sprache:	eng
Schlagworte:	Activation Applied sciences Arrays Circuit properties Crystal structure Crystallization Devices Electric, optical and optoelectronic circuits Electrodes Electronics Electrostatics Etching Exact sciences and technology Fabrication techniques lithography, pattern transfer High voltages Instruments, apparatus, components and techniques common to several branches of physics and astronomy Insulation Integrated optics. Optical fibers and wave guides Mechanical instruments, equipment and techniques Micromechanical devices and systems Mirrors Optical and optoelectronic circuits Physics Process design Semiconductor device modeling Silicon Silicon on insulator technology Voltage
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