Component redistribution during Nb and In/Nb film growth on single-crystal silicon

The component redistribution during the growth of Nb and In/Nb films on single-crystal silicon has been studied by Rutherford backscattering spectroscopy and X-ray diffraction. The results indicate that magnetron sputtering of indium onto niobium films gives rise to mass transfer across the Nb/Si in...

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Veröffentlicht in:Inorganic materials 2009-09, Vol.45 (9), p.998-1002
Hauptverfasser: Afonin, N. N., Logacheva, V. A., Khoviv, A. M., Vakhtel’, V. M., Shramchenko, Yu. S.
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container_end_page 1002
container_issue 9
container_start_page 998
container_title Inorganic materials
container_volume 45
creator Afonin, N. N.
Logacheva, V. A.
Khoviv, A. M.
Vakhtel’, V. M.
Shramchenko, Yu. S.
description The component redistribution during the growth of Nb and In/Nb films on single-crystal silicon has been studied by Rutherford backscattering spectroscopy and X-ray diffraction. The results indicate that magnetron sputtering of indium onto niobium films gives rise to mass transfer across the Nb/Si interface and to niobium and silicon heterodiffusion, accompanied by chemical reactions and the formation of silicides. The likely reason for this is the generation of defects during the magnetron sputtering of indium.
doi_str_mv 10.1134/S0020168509090106
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subjects Chemistry
Chemistry and Materials Science
Diffraction
Film growth
Indium
Industrial Chemistry/Chemical Engineering
Inorganic Chemistry
Magnetron sputtering
Mass transfer
Materials Science
Niobium
Silicon
Single crystals
title Component redistribution during Nb and In/Nb film growth on single-crystal silicon
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