Controlled growth of Co nanofilms on Si(100) by ion-beam deposition

This paper examines the effect of ion-beam sputtering conditions on the nucleation of Co nanofilms on Si(100). The argon ion energy is shown to play a key role in determining the sputtering process. Sputtering a cobalt target with argon ions less than 0.8 keV in energy produces granular layers. The...

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Veröffentlicht in:	Inorganic materials 2011-08, Vol.47 (8), p.869-875
Hauptverfasser:	Stognij, A. I., Pashkevich, M. V., Novitskii, N. N., Gribkov, B. A., Mironov, V. L., Geras’kin, A. A., Ketsko, V. A., Fettar, F., Garad, H.
Format:	Artikel
Sprache:	eng
Schlagworte:	Argon Chemistry Chemistry and Materials Science Cobalt Deposition Industrial Chemistry/Chemical Engineering Inorganic Chemistry Ion beams Materials Science Nanomaterials Nanostructure Nucleation Sputtering
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