Non Topcoat Self-freezing Photoresist for Double Patterning Process

Double patterning is one of the most promising techniques for sub-30nm half pitch device manufacturing. Several techniques such as dual-trench (litho-etch-litho-etch: LELE) and dual-line (litho-litho-etch : LLE) have been reported. Between them, the dual-line process attracts a great deal of attenti...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2010/06/22, Vol.23(2), pp.199-204
Hauptverfasser:	Ito, Koji, Mita, Michihiro, Wakamatsu, Goji, Anno, Yusuke, Fujisawa, Tomohisa, Osaki, Hitoshi, Hoshiko, Kenji, Tanaka, Hiromitsu, Nishimura, Yukio, Sugiura, Makoto, Yamaguchi, Yoshikazu, Shimokawa, Tsutomu
Format:	Artikel
Sprache:	eng
Schlagworte:	Devices double patterning Freezing Immersion Lithography non-topcoat Patterning Photopolymers Photoresists Resists self-freezing Variability
Online-Zugang:	Volltext
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